Surface Microscopy with Low Energy Electrons

Chapter 1. Introduction Abstract 1.1. The early years 1.2. The postwar revival References Chapter 2. Basic Interactions Abstract 2.1 Fundamental theories of electron emission 2.2 Photoemission 2.2.1 General considerations 2.2.2 The free electron gas approximation 2.2.3 Band structure UV photoemission 2.2.4 Spin effects in UV photoemission 2.2.5 Surface plasmon photoemission 2.2.6 X-ray photoemission 2.2.6.1 Photoelectron emission 2.2.6.2 Secondary electron emission 2.3 Electron reflection 2.3.1 General considerations 2.3.2 Elastic scattering 2.3.3 Inelastic scattering 2.3.4 Surface effects 2.3.5 VLEED, LEETS, TCS 2.3.6 Quantum well effects 2.3.7 Other aspects References Chapter 3. Instrumentation Abstract 3.1 Instruments: from simple to complex3.1.1 PEEM 3.1.2 LEEM 3.1.3 Aberration-corrected instruments 3.1.4 Spectroscopic imaging instruments 3.1.5 Spin-resolved imaging instruments 3.2 Components 3.2.1 Objective lens and other axial-symmetric lenses 3.2.2 Magnetic deflectors 3.2.3 Electron mirrors 3.2.4 Aberration correctors 3.2.5 Energy filters 3.2.6 Wien filters 3.2.7 Photon sources 3.2.8 Electron sources 3.2.9 Other components (image detectors vacuum system including airlock and specimen preparation chamber, electronics) References Chapter 4. Theory of image formation Abstract 4.1 Introduction 4.2 Wave propagation: The contrast transfer function 4.2.1 Low energy electron microscopy. The wave amplitude| 4.2.2 The image intensity 4.2.3 Mirror electron microscopy 4.2.4 Emission electron microscopy 4.3 Through-focus series image improvement 4.4 Information transfer in the image acquisition system 4.5 Summary and outlook References Chapter 5. Applications in surface science Abstract 5.1 Surface microstructure 5.1.1 Metals 5.1.2 Semiconductors 5.1.2.1 Si(111) 5.1.2.2 Si(100) 5.1.2.3 Other Si surfaces 5.1.3 Other inorganic semiconductor surfaces 5.1.4 Other inorganic compound surfaces 5.2 Adsorption 5.2.1 Adsorption on metals 5.2.1.1 Nonmetallic adsorbates 5.2.1.2 Coadsorption and reaction: catalysis 5.2.1.3 Metallic adsorbates 5.2.2 Adsorption on Semiconductors 5.2.2.1 Metallic adsorbates 5.2.2.2 Nonmetallic adsorbates 5.3 Film growth and structure 5.3.1 Films on semiconductors 5.3.1.1 Metal films 5.3.1.2 Ge on Si 5.3.1.3 Other films on semiconductors 5.3.1.4 Nanostructures and droplets on semiconductors5.3.2 Films on metals 5.3.2.1 Metal films 5.3.2.2 Inorganic compound films 5.3.3 Organic films References Chapter 6. Applications in other fields Abstract 6.1 Graphene 6.1.1 Introduction 6.1.2 Graphene on SiC 6.1.2.1 Growth and microstructure 6.1.2.2 Intercalation 6.1.3 Graphene on metals 6.1.3.1 Introduction 6.1.3.2 Growth and microstructure 6.1.3.3 Intercalation 6.2 Plasmons 6.2.1 Introduction 6.2.2 Linear structures 6.2.3 Nanostructures 6.2.4 Complex wave fields 6.2.5 Limitations 6.3 Technological applications 6.3.1 General materials applications 6.3.2 Electronics 6.4 Biology 6.5 A multimethod case study References Chapter 7. Magnetic imaging Abstract7.1 Introduction 7.2 Ferromagnetic films 7.2.1 Single layers 7.2.2 Quantum well effects 7.2.3 Bilayers 7.2.4 Trilayers 7.2.5 Multilayers 7.2.6 Compound layers 7.3 Bulk magnetic materials 7.3.1 Ferromagnetic materials 7.3.2 Antiferromagnetic materials 7.4 Ferromagnetic-antiferromagnetic interfaces 7.5 Nanostructures 7.5.1 Introduction 7.5.2 Static domain structure 7.5.3 Field and current influence 7.5.4 Nanodots and nanostructure arrays 7.6. Ferroelectrics / Multiferroics 7.6.1 Ferroelectries 7.6.2 Multiferroics Chapter 8. Other surface imaging methods with electrons Abstract 8.1 Scanning Low Energy Electron Microscopy 8.2 Scanning Low Energy Electron Diffraction Microscopy 8.3 Reflection Electron Microscopy 8.4 Secondary and Auger Electron Microscopy 8.5 Scanning Electron Microscopy with Spin Analysis 8.6 Scanning Photoelectron Emission Microscopy 8.7 Concluding remarks