| Foreword. A View of the Past, and a Look into the Future by a Pioneer By Jacques I. Pankove | p. XV |
| Introduction | p. 1 |
| General Properties of Nitrides | p. 8 |
| Crystal Structure of Nitrides | p. 8 |
| Gallium Nitride | p. 11 |
| Chemical Properties of GaN | p. 13 |
| Thermal and Mechanical Properties of GaN | p. 14 |
| Aluminum Nitride | p. 17 |
| Thermal and Chemical Properties of AlN | p. 17 |
| Mechanical Properties of AlN | p. 19 |
| Electrical Properties of AlN | p. 20 |
| Optical Propertiesof AlN | p. 21 |
| Indium Nitride | p. 23 |
| Crystal Structureof InN | p. 24 |
| Mechanical and Thermal Properties of InN | p. 25 |
| Electrical Properties of InN | p. 25 |
| Optical Properties of InN | p. 26 |
| Ternary and Quaternary Alloys | p. 26 |
| Al GaN Alloy | p. 27 |
| In GaN Alloy | p. 29 |
| In AlN Alloy | p. 31 |
| Substrates for Nitride Epitaxy | p. 31 |
| A Appendix Fundamental Data for Nitride Systems | p. 39 |
| Electronic Band Structure of Bulk and QW Nitrides | p. 45 |
| Band-Structure Calculations | p. 45 |
| Effectof Strainonthe Band Structureof GaN | p. 51 |
| kċp Theory and the Quasi-Cubic Model | p. 52 |
| Quasi-Cubic Approximation | p. 54 |
| Confined States | p. 57 |
| Conduction Band | p. 61 |
| Valence Band | p. 63 |
| Exciton Binding Energy in Quantum Wells | p. 66 |
| Polarization Effects | p. 68 |
| A Appendix | p. 80 |
| Growth of Nitride Semiconductors | p. 83 |
| Bulk Growth | p. 84 |
| Substrates Used | p. 87 |
| Conventional Substrates | p. 88 |
| Compliant Substrates | p. 88 |
| Van der Waals Substrates | p. 89 |
| Substrate Preparation | p. 89 |
| Substrate Temperature | p. 94 |
| Epitaxial Relationship to Sapphire | p. 95 |
| Growth by Hydride Vapor Phase Epitaxy (HVPE) | p. 98 |
| Growth by OMVPE (MOCVD) | p. 99 |
| Sources | p. 100 |
| Buffer Layers | p. 102 |
| Lateral Growth | p. 109 |
| Growth on Spinel (MgAl2O4) | p. 112 |
| Molecular Beam Epitaxy | p. 112 |
| MBE Growth Systems | p. 113 |
| Plasma-Enhanced MBE | p. 114 |
| Reactive-Ion MBE | p. 117 |
| Reactive MBE | p. 118 |
| Modeling of the MBE-Like Growth | p. 125 |
| Growth on 6H-SiC (0001) | p. 127 |
| Growthon ZnO | p. 129 |
| Growthon GaN | p. 136 |
| Growthofp-Type GaN | p. 137 |
| Growthofn-Type InN | p. 139 |
| Growthofn-Type Ternaryand Quaternary Alloys | p. 139 |
| Growthofp-Type Ternaryand Quaternary Alloys | p. 140 |
| Critical Thickness | p. 141 |
| Defects and Doping | p. 149 |
| Dislocations | p. 150 |
| Stacking-Fault Defects | p. 151 |
| Point Defects and Autodoping | p. 153 |
| Vacancies, Antisites and Interstitials | p. 154 |
| Role of Impurities and Hydrogen | p. 160 |
| Optical Signatureof Defectsin GaN | p. 163 |
| Intentional Doping | p. 165 |
| n-Type Dopingwith Silicon, Germanium and Selenium | p. 165 |
| p-Type Doping | p. 167 |
| Dopingwith Mg | p. 168 |
| Optical Manifestation of Group-II Dopant-Induced Defects in GaN | p. 179 |
| Doping with Beryllium | p. 182 |
| Dopingwith Mercury | p. 182 |
| Dopingwith Carbon | p. 183 |
| Dopingwith Zinc | p. 184 |
| Dopingwith Caicium | p. 184 |
| Dopingwith Rare Earths | p. 184 |
| Ion Implantationand Diffusion | p. 185 |
| Defect Analysis by Deep-Level Transient Spectroscopy | p. 186 |
| Summary | p. 190 |
| Metal Contacts to GaN | p. 191 |
| A Primer for Semiconductor-Metal Contacts | p. 192 |
| Current Flowin Metal-Semiconductor Junctions | p. 196 |
| The Regime Dominated by Thermionic Emission | p. 197 |
| Thermionic Field-Emission Regime | p. 198 |
| Direct Tunneling Regime | p. 199 |
| Leakage Current | p. 200 |
| The Case of a Forward-Biasedp-n Junction | p. 200 |
| Resistance of an Ohmic Contact | p. 202 |
| Specific Contact Resistivity | p. 203 |
| Semiconductor Resistance | p. 204 |
| Determinationofthe Contact Resistivity | p. 206 |
| Ohmic Contactsto GaN | p. 207 |
| Non-Alloyed Ohmic Contacts | p. 208 |
| Alloyed Ohmic Contacts | p. 209 |
| Multi-Layer Ohmic Contacts | p. 209 |
| Structural Analysis | p. 213 |
| Observations | p. 215 |
| Determination of Impurity and Carrier Concentrations | p. 216 |
| Impurity Binding Energy | p. 216 |
| Conductivity Type: Hot Probeand Hall Measurements | p. 217 |
| Densityof States and Carrier Concentration | p. 219 |
| Electronand Hole Concentrations | p. 223 |
| Temperature Dependenceof the Hole Concentration | p. 224 |
| Temperature Dependenceof the Electron Concentration | p. 227 |
| Multiple Occupancyof the Valence Bands | p. 229 |
| A Appendix Fermi Integral | p. 232 |
| Carrier Transport | p. 233 |
| Ionized Impurity Scattering | p. 235 |
| Polar-Optical Phonon Scattering | p. 236 |
| Piezoelectric Scattering | p. 239 |
| Acoustic Phonon Scattering | p. 239 |
| Alloy Scattering | p. 242 |
| The Hall Factor | p. 248 |
| Other Methods Used for Calculating the Mobility in n-GaN | p. 249 |
| Measured vis.a vis.Calculated Mobilities in GaN | p. 251 |
| Transport in 2D n-Type GaN | p. 257 |
| Transportinp-Type Ga Nand Al GaN | p. 258 |
| Carrier Transportin InN | p. 260 |
| Carrier Transportin AlN | p. 262 |
| Transport in Unintensionally-Doped and High-Resistivity GaN | p. 263 |
| Observation | p. 266 |
| The p-n Junction | p. 267 |
| Heterojunctions | p. 267 |
| Band Discontinuities | p. 268 |
| GaN/AlN Heterostructures | p. 270 |
| GaN/In Nand AlN/InN | p. 271 |
| Electrostatic Characteristicsofp-n Heterojunctions | p. 275 |
| Current-Voltage Characteristicsonp-n Junctions | p. 278 |
| Generation-Recombination Current | p. 279 |
| Surface Effects | p. 282 |
| Diode Current Under Reverse Bias | p. 284 |
| Effectof the Electric Field onthe Generation Current | p. 284 |
| Diffusion Current | p. 285 |
| Diode Current Under Forward Bias | p. 287 |
| Calculation and Experimental I-V Characteristics of GaN Basedp-n Juctions | p. 288 |
| Concluding Remarks | p. 294 |
| Optical Processes in Nitride Semiconductors | p. 295 |
| Absorption and Emission | p. 296 |
| Band-to-Band Transitions | p. 300 |
| Excitonuc Transitions | p. 302 |
| Optical Transitionsin GaN | p. 303 |
| Excitonic Transitions in GaN | p. 303 |
| Free Excitons | p. 303 |
| Bound Excitons | p. 317 |
| Exciton Recombination Dynamics | p. 318 |
| High Injection Levels | p. 322 |
| Free-to-Bound Transitions | p. 322 |
| Donor-Acceptor Transitions | p. 323 |
| Defect-Related Transitions | p. 326 |
| Yellow Luminescence | p. 326 |
| Group-II Element Related Transitions | p. 329 |
| Optical Properties of Nitride Heterostructures | p. 331 |
| GaN/Al GaN Heterostructures | p. 332 |
| In GaN/Ga Nand In GaN/In GaN Heterostructures | p. 336 |
| Light-Emitting Diodes | p. 340 |
| Current-Conduction Mechanism in LED-Like Structures | p. 341 |
| Optical Output Power | p. 344 |
| Losses and Efficiency | p. 345 |
| Visible-Light Emitting Diodes | p. 350 |
| Nitride LED Performance | p. 352 |
| Onthe Natureof Light Emissionin Nitride-Based LEDs | p. 360 |
| Pressure Dependence of Spectra | p. 360 |
| Current and Temperature Dependence of Spectra | p. 363 |
| I-V Characteristics of Nitride LEDs | p. 366 |
| LED Degradation | p. 370 |
| Luminescence Conversion and White- Light Generation With Nitride LEDs | p. 373 |
| Organic LEDs | p. 376 |
| Semiconductor Lasers | p. 379 |
| A Primertothe Principlesof Lasers | p. 381 |
| Fundamentals of Semiconductor Lasers | p. 382 |
| Waveguiding | p. 389 |
| Analytical Solution to the Waveguide Problem | p. 390 |
| Numerical Solutionof the Waveguide Problem | p. 394 |
| Far-Field Pattern | p. 402 |
| Lossand Threshold | p. 405 |
| Optical Gain | p. 406 |
| Gainin Bulk Layers | p. 407 |
| Gainin Quantum Wells | p. 410 |
| Coulombic Effects | p. 413 |
| Gain Calculationsfor GaN | p. 417 |
| Optical Gainin Bulk GaN | p. 418 |
| Gainin GaN Quantum Wells | p. 419 |
| Gain Calculations in Wz GaN QW Without Strain | p. 419 |
| Gain Calculations in WZ QW With Strain | p. 420 |
| Gain in ZB QW Structures Without Strain | p. 423 |
| Gain in ZB QW Structures with Strain | p. 424 |
| Pathways Through Excitons and Localized States | p. 425 |
| Measurement of Gain in Nitrides | p. 431 |
| Gain Measurementvia Optical Pumping | p. 431 |
| Gain Measurement via Electrical Injection (Pump)andan Optical Probe | p. 437 |
| Threshold Current | p. 439 |
| Analysis of Injection Lasers with Simplifying Assumptions | p. 440 |
| Recombination Lifetime | p. 442 |
| Quantum Efficiency | p. 448 |
| Gain Spectraof In GaN Injection Lasers | p. 450 |
| Observations | p. 456 |
| A Succinct Reviewofthe Laser Evolutionin Nitrides | p. 457 |
| References | p. 461 |
| Subject Index | p. 485 |
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