Preface | p. xiii |
Authors | p. xv |
Partial list of abbreviations, acronyms, and symbols | p. xvii |
Semiconductor packages | |
History and background | p. 3 |
Objectives | p. 3 |
Introduction | p. 3 |
Brief history | p. 4 |
Hermetic packaging | p. 4 |
Plastic packaging | p. 4 |
Wire bonding process flow | p. 5 |
Flip-chip process flow comparison | p. 5 |
Equipment | p. 6 |
Material interactions | p. 6 |
Bibliography | p. 9 |
Package form factors and families | p. 11 |
Objectives | p. 11 |
Introduction | p. 11 |
Package outline standardization | p. 11 |
Leaded package families | p. 12 |
Dual lead package family | p. 12 |
Quad lead package family | p. 13 |
Substrate-based package families | p. 13 |
Ball grid array package family | p. 14 |
Chip scale packages | p. 15 |
Substrate-based chip scale packages | p. 16 |
Quad flat no lead | p. 16 |
Stacked-die package family | p. 17 |
Package-on-package and related variations | p. 17 |
Flip-chip packages | p. 18 |
Wafer-level chip scale packages | p. 18 |
Bibliography | p. 20 |
Surface-mount technology | p. 23 |
Objectives | p. 23 |
Introduction | p. 23 |
Background | p. 24 |
Package cracking or "popcorning" | p. 27 |
Surface-mount packages: peripheral leads versus area array | p. 27 |
Issues with advanced packaging | p. 29 |
Current and future trends | p. 30 |
Lead-free and halogen-free packaging | p. 30 |
Bibliography | p. 31 |
Other packaging needs | p. 33 |
Objectives | p. 33 |
Introduction | p. 33 |
Tape automated bonding | p. 33 |
Micro electro-mechanical systems (MEMS) | p. 34 |
Image sensor modules | p. 35 |
Memory cards | p. 35 |
Packaging needs for solar technology | p. 40 |
Bibliography | p. 41 |
Package reliability | |
Reliability testing | p. 45 |
Introduction | p. 45 |
Background | p. 46 |
Examples of reliability tests | p. 46 |
Preconditioning conditions | p. 48 |
Package failure mode: package crack or popcorning | p. 48 |
Temperature cycling and thermal shock | p. 48 |
Package failure modes from temperature cycling and thermal shock | p. 54 |
Package failure mode: delamination | p. 54 |
High-temperature storage life | p. 55 |
Package failure mode: intermetallics | p. 55 |
Temperature-humidity-bias tests | p. 55 |
Package failure mode: corrosion | p. 55 |
Limitations of reliability testing | p. 56 |
Bibliography | p. 57 |
Materials used in semiconductor packaging | |
Polymers | p. 61 |
Molding compounds | p. 61 |
Objectives | p. 61 |
Introduction | p. 61 |
Background | p. 61 |
Newer formulations | p. 64 |
Biphenyl | p. 64 |
Multifunctional | p. 65 |
Aromatic resins | p. 65 |
Technology challenges | p. 66 |
Moldability | p. 66 |
Glass transition temperature | p. 67 |
Flexural modulus | p. 67 |
Coefficient of thermal expansion | p. 68 |
Stress index | p. 68 |
Failure modes associated with molding compounds | p. 69 |
Package cracking during solder reflow | p. 69 |
Substrate postmold warpage | p. 71 |
Future developments | p. 72 |
"Green" molding compounds and changes to flame retardant additives | p. 72 |
Molded underfill | p. 74 |
High-density packaging | p. 74 |
Compatibility with copper wire bonding | p. 75 |
Die attach adhesives | p. 75 |
Objectives | p. 75 |
Introduction | p. 76 |
Background | p. 76 |
Materials composition | p. 78 |
Liquid epoxy resin | p. 78 |
Silver flakes and other filler materials | p. 78 |
Reactive epoxy diluents and solvents | p. 78 |
Catalysts and hardeners | p. 78 |
Other additives | p. 78 |
Materials analysis | p. 79 |
Glass transition temperature | p. 79 |
Coefficient of thermal expansion | p. 79 |
Thixotropic index | p. 79 |
Ionic purity | p. 80 |
Reliability and performance | p. 81 |
Outgassing | p. 81 |
Resin bleed | p. 81 |
Future developments | p. 82 |
Three-dimensional (3D) packaging | p. 82 |
Lead-free and restriction of hazardous substances (RoHS) | p. 83 |
Compatibility with copper wire bonding | p. 83 |
Other developments | p. 84 |
Underfill materials | p. 84 |
Objectives | p. 84 |
Introduction | p. 84 |
What is underfill? | p. 84 |
The purpose of underfill | p. 84 |
The (standard) underfill process | p. 85 |
Underfill properties | p. 86 |
Glass transition temperature | p. 87 |
Coefficient of thermal expansion | p. 87 |
Alternate underfill processes | p. 87 |
"No-flow" underfill | p. 87 |
Reworkable underfill | p. 88 |
Preapplied underfill | p. 88 |
Molded underfill | p. 89 |
Areas of research and development | p. 90 |
Maintaining capillary flow as features sizes shrink | p. 90 |
Compatibility with lead-free bump process steps, including for copper pillar bumps | p. 90 |
Failure modes | p. 90 |
Organic substrates | p. 91 |
Objectives | p. 91 |
Introduction | p. 91 |
Background | p. 91 |
Ball grid arrays and chip scale packages | p. 92 |
Microvias and high-density interconnect technology | p. 93 |
Future developments | p. 94 |
Bibliography | p. 97 |
Metals | p. 101 |
Lead frames, heat spreaders, and heat sinks | p. 101 |
Objectives | p. 101 |
Introduction | p. 101 |
Lead frames | p. 101 |
Metals commonly used in lead frames and other components | p. 102 |
Copper | p. 102 |
Alloy42 | p. 103 |
Aluminum | p. 104 |
Heat slugs, heat spreaders, and heat sinks | p. 104 |
Heat slugs or spreaders | p. 104 |
Heat sinks | p. 106 |
Plating finishes | p. 107 |
Bonding wires | p. 107 |
Objectives | p. 107 |
Introduction | p. 107 |
Bonding wires | p. 108 |
Gold | p. 108 |
Copper | p. 108 |
Aluminum | p. 110 |
Other | p. 110 |
Kirkendall effect | p. 111 |
Gold-aluminum intermetallics and Kirkendall effect | p. 111 |
Kirkendall effect for copper wire bonding on aluminum bond pads | p. 112 |
Heat-affected zone phenomenon in bonding wire | p. 112 |
How is the heat-affected zone created? | p. 113 |
Effect of heat-affected zone on loop height | p. 113 |
Other reliability issues | p. 113 |
Copper wire bonding and corrosion | p. 113 |
Materials analysis | p. 114 |
Visual inspection | p. 115 |
Bond etching | p. 115 |
Bond pull | p. 115 |
Ball shear tests | p. 115 |
Recent developments | p. 115 |
Copper wire bonding on nickel-palladium electroless plated bond pads | p. 116 |
Solders | p. 116 |
Objectives | p. 116 |
Introduction | p. 117 |
Types of solders | p. 117 |
Lead-based | p. 117 |
Lead-free | p. 118 |
Gold-based | p. 120 |
Wafer bumping | p. 121 |
Objectives | p. 121 |
Introduction | p. 121 |
Bump metallurgies | p. 122 |
"C4" | p. 123 |
Electroplating | p. 123 |
Electroless (UBM) plating and screen/stencil printing solder | p. 125 |
Lead-free bumping metallurgies | p. 126 |
Alternative to solder bumping technologies | p. 127 |
Under-bump metallurgy | p. 127 |
Vacuum deposition | p. 128 |
Electroplating | p. 128 |
Electroless plating | p. 128 |
Technical issues | p. 128 |
Future directions | p. 129 |
Bibliography | p. 129 |
Ceramics and glasses | p. 133 |
Objectives | p. 133 |
Introduction | p. 133 |
Types of ceramics used in semiconductor packaging | p. 133 |
Alumina | p. 135 |
Beryllia | p. 135 |
Aluminum nitride | p. 135 |
Silicon carbide | p. 136 |
Boron nitride | p. 137 |
Types of glasses used in semiconductor packaging | p. 137 |
Silver-filled glass | p. 139 |
Lead alkali borosilicate glass | p. 139 |
Bibliography | p. 139 |
The future | |
Trends and challenges | p. 143 |
Objectives | p. 143 |
Introduction | p. 143 |
Copper interconnects and 1ow-k dielectric materials | p. 143 |
Copper interconnects | p. 143 |
Dielectric materials | p. 145 |
Dielectric constant requirements at each technology node | p. 146 |
Future interconnect and dielectric materials | p. 148 |
Interconnects for <22 run | p. 148 |
Dielectric materials for >22 run | p. 150 |
Dielectric materials for <22 nm | p. 150 |
| p. 151 |
Codesigning the chip with the package | p. 151 |
Three-dimensional (3D) integration | p. 151 |
Through-silicon vias | p. 151 |
Bibliography | p. 153 |
Light-emitting diodes | p. 155 |
Objectives | p. 155 |
Introduction | p. 155 |
Unique characteristics of light-emitting diode (LED) packaging needs | p. 157 |
Reliability requirements for LED packages | p. 160 |
Bibliography | p. 161 |
Glossary | p. 163 |
Bibliography | p. 165 |
Analytical tools | p. 167 |
Introduction | p. 167 |
Types of analytical tools | p. 167 |
Nondestructive tools and tests | p. 168 |
Introduction | p. 168 |
Optical/visual inspection | p. 168 |
X-ray inspection | p. 168 |
Scanning acoustic microscopy | p. 170 |
Bibliography | p. 174 |
Destructive tools and tests | p. 177 |
Introduction | p. 177 |
Decapsulation | p. 178 |
Dye penetration | p. 178 |
Cross-sectioning and polishing | p. 178 |
Scanning electron microscopy (SEM) | p. 178 |
Transmission electron microscopy (TEM) | p. 179 |
Chemical and elemental tests | p. 180 |
Auger electron spectroscopy (AES) | p. 180 |
Energy-dispersive X-ray spectroscopy (EDS or EDX) | p. 181 |
Fourier transform infrared spectroscopy (FTIR) | p. 181 |
Secondary ion mass spectrometry (SIMS) | p. 183 |
Other analytical techniques | p. 183 |
Bonding wire pull | p. 183 |
Ball bond shear | p. 183 |
Differential scanning calorimetry (DSC) | p. 184 |
Flexural testing | p. 184 |
Bibliography | p. 186 |
Index | p. 189 |
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