| Monte Carlo Simulation Techniques for Quantitative X-Ray Microanalysis | p. 1 |
| Transport Equation Approach to Electron Microbeam Analysis: Fundamentals and Applications | p. 13 |
| Use of Soft X-Rays in Microanalysis | p. 39 |
| Intensity Measurement of Wavelength Dispersive X-Ray Emission Bands: Applications to the Soft X-Ray Region | p. 61 |
| Synchrotron Radiation Induced X-ray Microfluorescence Analysis | p. 87 |
| Particle-Induced X-Ray Emission - A Quantitative Technique Suitable for Microanalysis | p. 117 |
| Cathodoluminescence Microscopy and Spectroscopy of Semiconductors and Wide Bandgap Insulating Materials | p. 135 |
| Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) | p. 167 |
| Three-Dimensional Nanoanalysis with the Tomographic Atom-Probe | p. 183 |
| Microanalysis at Atomic Resolution | p. 195 |
| Composition of Vanadium Carbides Formed by Solidification in Fe-V-C-M Alloys: Influence of Additions (M = Al, Cu, Mo) | p. 209 |
| Electron Transmission Coefficient for Oblique Angle of Incidence | p. 217 |
| Depth Distribution Function for Oblique Angle of Incidence | p. 225 |
| Simulation of EDS Spectra Using X-RES Software | p. 233 |
| On the Use of the GeL[alpha] Line in Thin Film X-Ray Microanalysis of Si[subscript 1-x]Ge[subscript x]/Si Heterostructures | p. 241 |
| Computer Simulations of the X-Ray Intensity Distribution from Submicron Particles Embedded in a Matrix | p. 251 |
| Determination of Rare Earth Elements in Biological and Mineral Apatite by EPMA and LAMP-ICP-MS | p. 259 |
| Quantitative Analysis of the Compound Layer of Plasma Nitrided Pure Iron | p. 271 |
| Correction of the Edge Effect in Auger Electron Microscopy | p. 279 |
| Low Energy Imaging of Nonconductive Surfaces in SEM | p. 289 |
| Investigation of the Bonding Mechanism of Glass Ceramic Layers on Metal Alloys | p. 299 |
| Monte Carlo Method for Quantitative Analysis of Bulk and Layered Samples | p. 307 |
| SIMS Linescan Profiling of Chemically Bevelled Semiconductors: a Method of Overcoming Ion Beam Induced Segregation in Depth Profiling | p. 317 |
| Experimental Verification of Theoretical Models Simulating the Temperature Increase in EPMA of Glass | p. 325 |
| Quantitation of Mineral Elements of Different Fruit Pollen Grains | p. 333 |
| Electron Beam Induced Migration of Alkaline Ions in Silica Glass | p. 339 |
| Application of the Boltzmann Transport Equation in the Thickness Determination of Thin Films | p. 349 |
| Characterisation of the Shape of Microparticles via Fractal and Fourier Analyses of Scanning Electron Microscope Images | p. 355 |
| Calculation of the Surface Ionisation Using Analytical Models of Electron Backscattering | p. 363 |
| Thickness Determination of Thin Insulating Layers | p. 377 |
| High Energy and Angular Resolution Dynamic Secondary Ion Mass Spectrometry | p. 391 |
| EPMA and Mass Spectrometry of Soil and Grass Containing Radioactivity from the Nuclear Accident at Chernobyl | p. 399 |
| Application of a New Monte Carlo Simulation Algorithm to Electron Probe Microanalysis | p. 409 |
| Topography Development on Single Crystal MgO Under Ion Beam Bombardment | p. 419 |
| Determination of SPM TIP Shape Using Polystyrene Latex Balls | p. 425 |
| Combined Characterization of Nanostructures by AEM and STM | p. 435 |
| Study of Quasi-Fractal Many-Particle-Systems and Percolation Networks by Zero-Loss Spectroscopic Imaging, Electron Energy-Loss Spectroscopy and Digital Image Analysis | p. 443 |
| Calculation of Bremsstrahlung Spectra for Multilayer Samples | p. 453 |
| Thickness Measurement of Thin Films by EPMA - Influence of [phi](0), MAC's and Substrate | p. 463 |
| A Simple Procedure to Check the Spectral Response of an EDX Detector | p. 473 |
| Virtual WDS | p. 479 |
| Monte Carlo Simulation Program with a Free Configuration of Specimen and Detector Geometries | p. 485 |
| Barriers to Energy Dispersive Spectrometry with Low Energy X-Rays | p. 493 |
| Measurements of Ga[subscript 1-x]Al[subscript x]As Layers on GaAs with EDS | p. 501 |
| The Relative Intensity Factor for L[alpha] Radiation Considering the Different Mass Absorption of L[alpha] and L[beta] Radiation | p. 507 |
| Determination of the Solubility of Cerium in BaTiO[subscript 3] by Quantitative WDS Electron Probe Microanalysis | p. 517 |
| Simulation of X-Ray Diffraction Profiles of Gradually Relaxed Epilayers | p. 525 |
| Monte Carlo Simulation of Electron Scattering for Arbitrary 2D Structures Using a Modified Quadtree Geometry Discretization | p. 533 |
| Chemical-Bond Characterization of Nanostructures by EELS | p. 545 |
| Local Determination of Carbon by Combining Beta-Autoradiography and Electron Microprobe Analysis | p. 553 |
| The Check of the Elastic Scattering Model in Monte-Carlo Simulation | p. 559 |
| True Colour X-Ray Vision for Electron Microscopy and Microanalysis | p. 573 |
| Determination of the Oxidation States of Nb by Auger Electron Spectroscopy | p. 581 |
| Study by SIMS of the [superscript 54]Cr and [superscript 18]O Diffusion in Cr[subscript 2]O[subscript 3] and in Cr[subscript 2]O[subscript 3] Scales | p. 587 |
| Comparison of Back-Foil Scanning X-Ray Microfluorescence and Electron Probe X-Ray Microanalysis for the Elemental Characterisation of Thin Coatings | p. 597 |
| Electron Probe X-Ray Microanalysis of Coatings | p. 605 |
| Analysis of Layers: X-Ray Maps of Change in Thickness Obtained by Electron Macroprobe | p. 611 |
| Comparison of Simulated and Experimental Auger Intensities of Au, Pt, Ni and Si in Absolute Units | p. 623 |
| Practical Aspects and Applications of EPMA at Low Electron Energies | p. 631 |
| Oxidation and Reduction Processes of Be/BeO Induced by Electrons | p. 639 |
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