| Preface | |
| Fundamental Aspects of Ion Electron Interactions | p. 1 |
| Fundamentals of Ion-Solid Interactions: Atomic Collisions | p. 21 |
| Excitation and Ionization In Fast Ion-Atom Collisions Due To Projectile-Electron - Target-Electron Interactions | p. 37 |
| Radiation Induced Point Defects and Diffusion | p. 53 |
| High Temperature Oxidation and Corrosion of Metals and Alloys: Fundamentals and Influence of High Energy Beams | p. 77 |
| Thin Films of High-Temperature Superconductors: Application-Oriented Studies of Growth and Properties | p. 95 |
| An Overview of Surface Analysis. Application to the Adsorption of Li on Single Crystals of Layered Compounds | p. 115 |
| Depth Profiling in Combination with Sputtering | p. 133 |
| A SIMS Study of the Inter-Diffusion of Group III Atoms in a Distributed Bragg Reflection | p. 151 |
| Thermal He-Atom Scattering for the Study of Surface Systems: K on Si(001) | p. 159 |
| Experimental and Monte Carlo Simulation Studies of the Surface Concentration Changes in ZiO[subscript 2] under Ion Bombardment | p. 167 |
| Ion-Induced Photon Emission of Materials and Possibilities of its Application for Surface Diagnostics | p. 175 |
| The Raman Approach to Materials Science | p. 185 |
| Laser-Material Interaction. Plasma Formation and Applications | p. 219 |
| Optical Spectrometry Coupled with Laser Ablation for Analytical Applications on Solids | p. 237 |
| In Situ Laser Beam Probes for Semiconductor Processing | p. 259 |
| Laser Deposition and Patterning of Diamond Films | p. 269 |
| Laser-Raman Spectroscopy of Some Lanthanide/HgI[subscript 2] Heterometallic Complexes (HL=5,7-Dimethyl-1,8-Naphthyridine-2-OL) | p. 281 |
| Accelerators in Materials Research | p. 287 |
| Application of Elastic Recoil Detection in Materials Analysis | p. 301 |
| Applications of High Energy Ion Scattering in Materials Science | p. 323 |
| High Energy Heavy Ion RBS, ERDA and Channelling | p. 341 |
| Some New Detection Techniques for Light-Ion Scattering Analysis | p. 359 |
| Prompt Gamma Ray Resonant Nuclear Reaction Analysis for Light Elements: H, Li, F and Na | p. 375 |
| Quantitative Determination of Light Elements in Semiconductor Matrices by Charged Particle Activation Analysis | p. 387 |
| Thin Layer Activation in Materials Technology | p. 399 |
| Optimum Industrial Application of the Thin Layer Activation Technique | p. 415 |
| Ion Beam Analysis of Glasses - Industrial Applications | p. 427 |
| Nuclear Reaction Analysis of Corroded Glass Surfaces | p. 437 |
| Ion-Beam Archaeometry: Technological Assessment of Ancient and Medieval Materials | p. 443 |
| Non-Destructive Analysis Of American Gold Jewelry Items By PIXE, RBS and PIGE | p. 463 |
| Recoil Spectrometry: A Suitable Method for Studying Interfacial Reactions in Metal-InP Systems | p. 471 |
| Bismuth-Implanted Silicon Reference Material Revisited: The Concept of Traceability and the Individual Characterisation of Chips | p. 477 |
| Energy Dispersive X-Ray Analysis of the Tin Distribution on Electrolytically Coloured Anodised Aluminium | p. 485 |
| Determination of Sulphur and Copper Distribution on Chemically Modified HEU-Type Zeolite Crystals by Means of Nuclear Resonant Reaction Analysis Techniques, Scanning Electron Microscopy and X-Ray Fluorescence | p. 493 |
| Modern Technological Projects with High Power Electron Beams | p. 501 |
| Computer-Aided Design of Technological Electron-Optical Systems | p. 513 |
| Ion Beam Mixing | p. 527 |
| Materials Modification Using Electron Beams | p. 557 |
| Deposition and Etching Mechanisms in Plasma Thin Film Processes | p. 581 |
| Active Modification and Amorphisation of Materials by Low-Energy Ion Irradiation | p. 595 |
| SIMOX Thin Films, Structural and Electrical Characterisation using FTIR Spectroscopy | p. 603 |
| The Key Role of Electron Beams in IC Technology | p. 613 |
| Cadmium Sulphide Microcrystalline-Doped Silicon Dioxide Thin Films Prepared by RF-Sputtering: Growth and Physical Characterisation | p. 623 |
| Synchrotron Radiation Sources for Materials Technology | p. 633 |
| Photoemission and EXAFS Study of Na on 2H-TaS[subscript 2] | p. 653 |
| Characterisation of Nearly Stoichiometric Buried Si[subscript x]N[subscript y] Films with EXAFS and NEXAFS | p. 661 |
| List of Contributors | p. 669 |
| List of Participants | p. 670 |
| Index | p. 673 |
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