Plasma Charging Damage

By: Kin P. Cheung, K. P. Cheung

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Hardcover | 4 October 2000

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Hardcover
364 Pages

Dimensions(cm)
24.13 x 17.15 x 2.54

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In the 50 years since the invention of transistor, silicon integrated circuit (IC) technology has made astonishing advances. A key factor that makes these advances possible is the ability to have precise control on material properties and physical dimensions. The introduction of plasma processing in pattern transfer and in thin film deposition is a critical enabling advance among other things. In state of the art silicon Ie manufacturing process, plasma is used in more than 20 different critical steps. Plasma is sometimes called the fourth state of matter (other than gas, liquid and solid). It is a mixture of ions (positive and negative), electrons and neutrals in a quasi-neutral gaseous steady state very far from equilibrium, sustained by an energy source that balances the loss of charged particles. It is a very harsh environment for the delicate ICs. Highly energetic particles such as ions, electrons and photons bombard the surface of the wafer continuously. These bombardments can cause all kinds of damage to the silicon devices that make up the integrated circuits.

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You Can Find This Book In

Non-Fiction Science Physics Engineering & Technology Mechanical Engineering & Materials Mechanical Engineering Electronics & Communications Engineering Electronics Engineering Electronic Devices & Materials Semi-Conductors & Super-Conductors Energy Technology & Engineering Electrical Engineering

Technology in General Engineering in General Industrial Chemistry & Manufacturing Technologies Industrial Chemistry Other Technologies & Applied Sciences Applied Optics Materials Science

Thin Gate-oxide Wear-out and Breakdown	p. 1
Mechanism of Plasma Charging Damage I	p. 47
Mechanism of Plasma Charging Damage II	p. 99
Mechanism of Plasma Charging Damage III	p. 169
Charging Damage Measurement I - Determination of Plasma's Ability to Cause Damage	p. 205
Charging Damage Measurement II - Direct Measurement of Damage	p. 245
Coping with Plasma Charging Damage	p. 311
Index	p. 343
Table of Contents provided by Blackwell. All Rights Reserved.

Plasma Charging Damage

At a Glance

Hardcover

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How to return your order

Defective items

You Can Find This Book In

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