Photomask Fabrication Technology

By: Benjamin G. Eynon, Banqiu Wu

Write A Review

Hardcover | 18 August 2005 | Edition Number 1

At a Glance

Hardcover
500 Pages

Dimensions(cm)
23.11 x 15.24 x 4.52

Hardcover

RRP $316.95

$251.75

21%OFF

or 4 interest-free payments of $62.94 with

Ships in 25 to 30 business days

Publisher's Note: Products purchased from Third Party sellers are not guaranteed by the publisher for quality, authenticity, or access to any online entitlements included with the product.

Photomasks are defect-free optical templates -- the printing masters for the fabrication of integrated circuits (ICs). When IC feature sizes fall below the exposure tool's source wavelength, photomask fabrication becomes difficult: very strict mask critical dimension (CD) and feature placement specifications, intensive capital equipment investment, unique raw materials and applications, and special expertise requirements for photomask fabrication technologists are necessary to fabricate modern microelectronics. Thus the rapid recent growth of the field and the need for this book.

This text details the science and technology of industrial photomask production, including fundamental principles, industrial production flows, technological evolution and development, and state of the art technologies. Focusing on industrial applications rather than pure science, the goal of the book is to provide a comprehensive reference for any engineer developing microelectronic manufacturing processes

Shipping

	Standard Shipping	Express Shipping
Metro postcodes:	$9.99	$14.95
Regional postcodes:	$9.99	$14.95
Rural postcodes:	$9.99	$14.95

Orders over $89.00 qualify for free shipping.

How to return your order

At Booktopia, we offer hassle-free returns in accordance with our returns policy. If you wish to return an item, please get in touch with Booktopia Customer Care.

Additional postage charges may be applicable.