NATO Science Series E

A Borderland between STM, EB, IB, and X-Ray Lithographies

By: M. Gentili (Editor), Carlo Giovannella (Editor), Stefano Selci (Editor)

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Hardcover | 30 April 1994

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232 Pages

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24.77 x 17.15 x 1.91

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Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography.
Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).

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Preface
Nanolithography, The Integrated System	p. 1
Electron Beam Resists and Pattern Transfer Methods	p. 13
Nanolithography Developed Through Electron-Beam-Induced Surface Reaction	p. 25
Direct Writing of Nanoscale Patterns in SiO[subscript 2]	p. 45
Sub-10 nm Electron Beam Lithography: -AlF-Doped Lithium Fluoride as a Resist	p. 53
Surface Imaging for EB-Nanolithography	p. 67
Patterning of InGaAs/GaAs Quantum Dots Using E-Beam Lithography and Selective Removal of the Top Barrier	p. 73
Fabrication of Ultrasmall InGaAs/InP Nanostructures by High Voltage Electron Beam Lithography and Wet Chemical Etching	p. 77
Fabrication, Investigation and Manipulation of Artificial Nanostructures	p. 81
Nano-Lithography in 3 Dimensions with Electron Beam Induced Deposition	p. 87
Nanolithography Requirements - An Equipment Manufacturers View	p. 95
X-Ray Nanolithography: Limits, and Applications to Sub-100 nm Manufacturing	p. 103
X-Ray Phase Shifting Masks	p. 121
Fabrication X-Ray Mask for Nanolithography by EBL	p. 129
Intense Focused Ion Beams for Nanostructurisation	p. 137
Latest Results Obtained with the Alpha Ion Projection Machine	p. 149
Direct Writing with a Combined STM/SEM System	p. 159
Low Voltage E-Beam Lithography with the Scanning Tunneling Microscope	p. 175
STM Nanolithography and Characterization of Passivated Silicon and Gallium Arsenide	p. 189
Sub-20 nm Lithographic Patterning with the STM	p. 197
Lithography of [actual symbol not reproducible] Superconducting Thin Films with a Scanning Tunneling Microscope	p. 207
Author Index	p. 213
Subject Index	p. 215
Table of Contents provided by Blackwell. All Rights Reserved.

NATO Science Series E

A Borderland between STM, EB, IB, and X-Ray Lithographies

At a Glance

Hardcover

Shipping

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Defective items

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