Microtechnology and Mems

Degradation Behavior and Damage Mechanisms

By: Flora Li, Arokia Nathan

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Hardcover | 1 March 2005

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Hardcover
244 Pages

Dimensions(cm)
23.5 x 15.24 x 1.27

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As the deep-ultraviolet (DUV) laser technology continues to mature, an increasing number of industrial and manufacturing applications are emerging. For example, the new generation of semiconductor inspection systems is being pushed to image at increasingly shorter DUV wavelengths to facilitate inspection of deep sub-micron features in integrated circuits. DUV-sensitive charge-coupled device (CCD) cameras are in demand for these applications. Although CCD cameras that are responsive at DUV wavelengths are now available, their long-term stability is still a major concern. This book describes the degradation mechanisms and long-term performance of CCDs in the DUV, along with new results of device performance at these wavelengths.

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Introduction
Overview of CCD
CCD Imaging in the Ultraviolet Regime
Silicon
Silicon Dioxide
Si-SiO2 Interface
General Effects of Radiation
Effects of Radiation on CCDs
UV-Induced Effects in Silicon
UV-Laser-Induced Effects in SiO2
UV-Laser-Induced Effects in the Si-SiO2 Interface
CCD Measurements at 157 nm
Design Optimizations for Future Research
Concluding Remarks
Glossary
Table of Contents provided by Publisher. All Rights Reserved.

Microtechnology and Mems

Degradation Behavior and Damage Mechanisms

At a Glance

Hardcover

Shipping

How to return your order

Defective items

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