
At a Glance
480 Pages
16.3 x 23.7 x 3.2
Hardcover
RRP $311.99
$280.99
10%OFF
or 4 interest-free payments of $70.25 with
 orÂShips in 15 to 25 business days
Laser cleaning is very important for modern high technology. It is used, or considered for use in the fabrication of printed circuit boards, in the production of dynamic random access memory (DRAM), in lithography and epitaxial growth, for the removal of contaminations during via-hole production, and for the cleaning of micro-optical and micro-mechanical components. This work presents the mechanics of the cleaning processes, experimental results, and different applications, including laser cleaning of art. It contains review articles by leading specialists in laser cleaning who participated in the First International Workshop on Laser Cleaning, held in Singapore in 2001.
Industry Reviews
| Preface | p. 1 |
| History | |
| The Road to "Steam Laser Cleaning" | p. 23 |
| Meeting Andrew C. Tam | p. 23 |
| A cleaning method needed | p. 24 |
| 'Laser cleaning' | p. 26 |
| 'Steam laser cleaning' | p. 29 |
| Steam laser cleaning with short-pulse IR-lasers | p. 33 |
| Steam laser cleaning: direct imaging of the jet motion | p. 34 |
| Opto-acoustic detection of the liquid film explosion | p. 40 |
| Steam laser cleaning: study of the mechanism of the liquid film explosion | p. 41 |
| Stencil masks again | p. 45 |
| Acknowledgement | p. 46 |
| Thanks to Andrew C. Tam | p. 46 |
| References | p. 46 |
| Dry Laser Cleaning | |
| Dry Laser Cleaning of Particles by Nanosecond Pulses: Theory | p. 51 |
| Introduction | p. 51 |
| Adhesion potential and equation of motion | p. 53 |
| Model expression for elastic-VdW potential | p. 53 |
| Parabolic approximation | p. 57 |
| Equation for the evolution of deformation h | p. 58 |
| Damping coefficient | p. 59 |
| Knudsen viscosity | p. 59 |
| Stokes viscosity | p. 59 |
| Absorption of sound | p. 60 |
| Emission of sound | p. 61 |
| Plastic deformation | p. 61 |
| Thermal expansion | p. 62 |
| Hierarchy of scales | p. 62 |
| General equations | p. 63 |
| Unilateral quasi-static expansion | p. 65 |
| 3D quasi-static expansion for finite beams with 1D heat conduction | p. 67 |
| Comparison between different approximations | p. 68 |
| Particle influence on the expansion of the substrate | p. 69 |
| Unilateral dynamic expansion | p. 70 |
| Thermal expansion of absorbing particle | p. 71 |
| Transparent particle heated by the substrate | p. 72 |
| Maximum energy of ejected particles | p. 72 |
| Cleaning threshold | p. 73 |
| General threshold conditions | p. 73 |
| Short cleaning pulse | p. 74 |
| Long cleaning pulse | p. 74 |
| Over-damped movement | p. 75 |
| Long pulses with steep fronts | p. 75 |
| Single sinusoidal pulse in parabolic potential without damping | p. 76 |
| Dependence of cleaning threshold on particle radius and pulse duration | p. 78 |
| SiO[subscript 2] particles cleaned from Si wafers | p. 82 |
| Experimental | p. 82 |
| Cleaning threshold vs. radius | p. 83 |
| Role of small oscillations in intensity | p. 86 |
| Suggestions for cleaning experiments | p. 87 |
| Conclusions | p. 89 |
| Acknowledgements | p. 90 |
| Quasi-static 3D thermal expansion | p. 90 |
| Cleaning threshold with the single sinusoidal pulse | p. 95 |
| References | p. 96 |
| Optical Resonance and Near-Field Effects in Dry Laser Cleaning | p. 103 |
| Introduction | p. 103 |
| Optical resonance and near-field effects within the Mie theory | p. 106 |
| Particle on the surface. Beyond the Mie theory | p. 117 |
| Adhesion potential and Hamaker-Lifshitz constant | p. 128 |
| Temperature under the particle | p. 138 |
| Dynamics of the particle, 3D effects | p. 144 |
| Comparison with experimental results | p. 155 |
| Local substrate ablation--a probe for optical near-fields | p. 155 |
| Morphology of near field-induced damage sites | p. 156 |
| Parameters influencing field enhancement induced ablation | p. 159 |
| Near field effects in the laser cleaning process | p. 162 |
| Experimental details | p. 162 |
| Variation of the size parameter | p. 163 |
| Variation of the particle size | p. 164 |
| Variation of the laser wavelength | p. 167 |
| Influence of incident angle | p. 168 |
| Influence of surface roughness | p. 169 |
| Conclusion | p. 170 |
| Acknowledgements | p. 172 |
| References | p. 172 |
| Steam Laser Cleaning | |
| Pulsed laser cleaning of particles from surfaces and optical materials | p. 181 |
| Introduction | p. 181 |
| Review tables of experimental pulsed laser cleaning of contaminants (mostly particles) from surfaces | p. 185 |
| Overview of the information in the tables | p. 185 |
| Silicon-wafers, hydrophilic and membrane masks | p. 190 |
| Glass and related optical surfaces | p. 196 |
| Other material surfaces | p. 198 |
| Experimental studies of laser cleaning particles from glass at Macquarie University | p. 198 |
| Single pulse laser cleaning studies | p. 198 |
| "Dip and tap" sample preparation | p. 198 |
| Dry/Damp laser cleaning | p. 199 |
| Before and after images--microscope slides and fused silica | p. 211 |
| Cleaning efficiency measured from optical microscopy images | p. 214 |
| Particle de-agglomeration and removal | p. 214 |
| Laser cleaning efficiency as a function of pulse fluence | p. 218 |
| Laser cleaning threshold fluence measurement | p. 220 |
| Concluding remarks | p. 222 |
| Acknowledgments | p. 223 |
| References | p. 223 |
| Liquid-Assisted Pulsed Laser Cleaning with Near Infrared and Ultraviolet-Pulsed Lasers | p. 229 |
| Introduction | p. 229 |
| Experiments | p. 232 |
| Laser cleaning system and optical diagnostics | p. 232 |
| Operation parameters and experimental procedures | p. 236 |
| Experimental results | p. 236 |
| Excimer laser cleaning | p. 236 |
| Nd: YAG laser cleaning | p. 237 |
| Summary of cleaning results | p. 240 |
| Physical mechanisms | p. 241 |
| In-situ monitoring of reflectance and visualization | p. 241 |
| Temperature, pressure, and bubble dynamics | p. 242 |
| Conclusion | p. 252 |
| Acknowledgments | p. 252 |
| References | p. 252 |
| Steam Laser Cleaning of Silicon Wafers: Laser Induced Bubble Nucleation and Efficiency Measurements | p. 255 |
| Introduction | p. 256 |
| Experimental | p. 257 |
| Sample preparation | p. 258 |
| Laser sources | p. 259 |
| Surface plasmon probe and optical reflectance probe | p. 260 |
| Scattered light probe | p. 262 |
| Evaluation of the cleaning efficiency | p. 262 |
| Determination of laser fluence | p. 263 |
| Laser induced bubble nucleation and pressure generation | p. 264 |
| Theoretical background | p. 265 |
| Kinetic limit of superheating | p. 265 |
| Nucleation theory | p. 267 |
| Experiments on metal films | p. 272 |
| Detection of bubble nucleation via SPP | p. 272 |
| Bubble nucleation on silicon wafers | p. 282 |
| Water at smooth silicon wafers | p. 283 |
| Water at structured silicon substrates | p. 289 |
| IPA on smooth silicon wafers | p. 292 |
| Heat transfer coefficient | p. 292 |
| Removal of particles on surfaces via laser induced bubble nucleation: steam laser cleaning | p. 294 |
| Efficiency measurements | p. 296 |
| Dependence on the number of applied laser pulses | p. 296 |
| Dependence on the laser fluence and variation on the particle size | p. 298 |
| Discussion and concluding remarks | p. 300 |
| Acknowledgments | p. 304 |
| References | p. 305 |
| Physical Mechanisms of Laser Cleaning | p. 311 |
| Introduction | p. 311 |
| Laser cleaning of the solid surface from particles | p. 312 |
| Dry laser cleaning | p. 313 |
| The cleaning force | p. 313 |
| Surface cleaning condition | p. 316 |
| Dry laser cleaning in the multipulse regime | p. 316 |
| Discussion | p. 318 |
| Steam laser cleaning | p. 319 |
| Absorbing particles at the transparent substrate | p. 319 |
| Transparent particles at the absorbing substrate | p. 321 |
| Absorbing particles at the absorbing substrate | p. 326 |
| Discussion | p. 327 |
| Laser cleaning of the solid surface from films | p. 327 |
| Laser cleaning by buckling mechanism | p. 328 |
| The main regularities and regimes of film buckling | p. 329 |
| Film ablation without melting before separation of the film fragment | p. 331 |
| Ablation of the melting film | p. 331 |
| Film degradation | p. 334 |
| Laser cleaning by film shaking-off | p. 337 |
| The conditions of action of shaking-off and buckling mechanisms of film ablation | p. 337 |
| Other mechanisms of laser cleaning of solid surfaces from films | p. 338 |
| Conclusion | p. 339 |
| Acknowledgments | p. 340 |
| References | p. 340 |
| Laser Cleaning of Artworks | |
| Laser Ablation in Cleaning of Artworks | p. 343 |
| Introduction | p. 343 |
| Laser ablation of complex polymerized materials | p. 344 |
| Optimization of laser parameters | p. 344 |
| Ablation efficiency studies | p. 346 |
| Light transmission studies | p. 353 |
| Chemical alteration of substrate | p. 355 |
| Laser-assisted removal of aged varnish from paintings | p. 358 |
| Laser-assisted removal of paint from composite materials | p. 365 |
| Laser divestment of encrustation | p. 370 |
| Major operative mechanisms and associated optical phenomena | p. 370 |
| Removal of encrustation--test case studies | p. 380 |
| Conclusions | p. 384 |
| Acknowledgments | p. 385 |
| References | p. 385 |
| On the Theory of Discoloration Effect in Pigments at Laser Cleaning | p. 393 |
| Introduction | p. 393 |
| The thermal ablation model | p. 395 |
| Method of moments | p. 398 |
| Thermal field within the ablated material. Numerical results | p. 402 |
| Kinetics of phase transition and surface modification | p. 405 |
| Acknowledgments | p. 411 |
| References | p. 411 |
| Applications of Laser Cleaning | |
| Cleaning for Field Emitter Arrays | p. 417 |
| Introduction | p. 417 |
| Experimental procedures | p. 419 |
| Laser light irradiation | p. 420 |
| Laser irradiation modes | p. 420 |
| Laser irradiation without field emission | p. 420 |
| Laser irradiation with field emission | p. 422 |
| IR and visible laser light ([lambda] = 1047 and 523.5 nm) irradiation | p. 422 |
| UV laser light ([lambda] = 349 nm) irradiation | p. 422 |
| UV laser light ([lambda] = 262 nm) irradiation | p. 429 |
| Conclusions | p. 430 |
| Acknowledgments | p. 431 |
| References | p. 431 |
| Laser Cleaning of Organic Contamination on Microelectronic Devices and Process Real-Time Monitoring | p. 433 |
| Introduction | p. 436 |
| Experimental setup | p. 438 |
| Results and discussion | p. 438 |
| Laser cleaning of flexible circuit for inkjet printer cartridge | p. 438 |
| Laser deflashing of IC packages | p. 441 |
| Signal generation and diagnostics during the laser cleaning | p. 448 |
| Audible acoustic wave generation | p. 451 |
| Diagnostics of plasma-induced electric field | p. 456 |
| Detection of plasma optical signal | p. 457 |
| Conclusions | p. 460 |
| Acknowledgments | p. 461 |
| References | p. 461 |
| Subject Index | p. 465 |
| Table of Contents provided by Syndetics. All Rights Reserved. |
ISBN: 9789810249410
ISBN-10: 9810249411
Published: 1st December 2001
Format: Hardcover
Language: English
Number of Pages: 480
Audience: Professional and Scholarly
Publisher: World Scientific Publishing Co Pte Ltd
Country of Publication: GB
Dimensions (cm): 16.3 x 23.7 x 3.2
Weight (kg): 0.82
Shipping
| Standard Shipping | Express Shipping | |
|---|---|---|
| Metro postcodes: | $9.99 | $14.95 |
| Regional postcodes: | $9.99 | $14.95 |
| Rural postcodes: | $9.99 | $14.95 |
Orders over $79.00 qualify for free shipping.
How to return your order
At Booktopia, we offer hassle-free returns in accordance with our returns policy. If you wish to return an item, please get in touch with Booktopia Customer Care.
Additional postage charges may be applicable.
Defective items
If there is a problem with any of the items received for your order then the Booktopia Customer Care team is ready to assist you.
For more info please visit our Help Centre.
You Can Find This Book In
This product is categorised by
- Non-FictionEngineering & TechnologyOther Technologies & Applied SciencesApplied OpticsLaser Technology & Holography
- Non-FictionEngineering & TechnologyMechanical Engineering & MaterialsMaterials Science
- Non-FictionSciencePhysicsOptical Physics
- Non-FictionScienceScience in GeneralScientific EquipmentMicroscopy
- Booktopia Publisher ServicesWorld Scientific Publishing






















