| Preface | |
| List of Contributors | |
| Defect Aspects of Advanced Device Technologies | p. 3 |
| Field Effect Analysis in Low Voltage Operation a-Si:H Thin Film Transistors with Very Thin PECVD a-SiO[subscript 2] Gate Dielectric | p. 27 |
| Silicon and Silicon: Germanium Alloy Growth; Means and Applications | p. 33 |
| Preparation and Characterization of Silicon Ribbons | p. 49 |
| Rapid Thermal Chemical Vapor Deposition of Si[subscript x]Ge[subscript 1-x] Alloys on Si and SiO[subscript 2] and New Applications of Si[subscript x]Ge[subscript 1-x] Alloys in Advanced MOSFET Processes | p. 55 |
| Kinetics and Dynamics of MBE Growth | p. 61 |
| Effects of Near-Interface Defects on the Optical Properties of MBE Grown GaAs/AlGaAs Layers | p. 79 |
| Optoelectric Materials | p. 83 |
| Electrical Characteristics of PECVD Silicon Nitride/Compound Semiconductor Interfaces for Optoelectronic Device Passivation | p. 103 |
| Fundamentals of Semiconductor Processing | p. 111 |
| Optical Analysis of Oxygen in Epitaxial Silicon | p. 119 |
| Electrical Properties of "Clean" and Fe-Decorated Stacking Faults in p-type Si | p. 129 |
| On the Dirty Contacts on n-type Silicon | p. 135 |
| Mossbauer Study of the DX-Center in Te-Implanted Al[subscript x]Ga[subscript 1-x]As | p. 141 |
| Surface Science and Semiconductor Processing | p. 147 |
| Lithography for Manufacturing at 0.25 Micrometer and Below | p. 153 |
| Basic Aspects of Ion Implantation | p. 167 |
| Trends in Ion Implantation for Semiconductor and Optical Materials Research | p. 195 |
| Orientation Phenomena in MeV Implants of P in Si | p. 207 |
| Deep Implants by Means of Channeling: Ion Distribution and Radiation Damage in Angle Controlled N[superscript +] Implantation in Silicon | p. 213 |
| Dislocation Formation in Si Implanted at Elevated Temperature | p. 219 |
| Preparation and Characterization of Thin Film Simox Materials | p. 225 |
| The Effect of Electronic Energy Loss on Epitaxial [actual symbol not reproducible] Thin Films After Heavy Ion Irradiation and Annealing up to Room Temperature | p. 233 |
| Structural Study of The Epitaxial Realignment of Polycrystalline Si Films onto Si Substrates | p. 239 |
| Plasma Immersion Ion Implantation: A Perspective | p. 245 |
| A Sheet Stress Measurement Technique Using Thin Films to Measure Stresses in Inert-Gas Implanted Silicon | p. 251 |
| Plasma Etching Processes | p. 257 |
| Charge Trapping, Degradation and Wearout of Thin Dielectric Layers During Electrical Stressing | p. 279 |
| Minority Carrier Lifetime Measurements After High Temperature Pretreatment | p. 299 |
| Copper-Based Metallization | p. 305 |
| Thermal Stability of Ti-Mo and Ti-Cu Bilayer Thin Films on Alumina | p. 321 |
| Hyperfine Fields in Epitaxially Grown Co on GaAs | p. 327 |
| Titanium Nitride Process Development | p. 331 |
| Materials Aspects and Implementation of Silicides for ULSI | p. 337 |
| Ion Beam Synthesis of Buried Iron Disilicide | p. 363 |
| Diffusion in Cobalt Silicide During Silicide Formation | p. 369 |
| Formation of Germanides by Rapid Thermal Annealing and Their Applications in Advanced MOSFET Processes | p. 375 |
| Diffusion in Crystalline Silicon and Germanium - The State of the Art in Brief | p. 383 |
| Symmetry Methods in Diffusion | p. 403 |
| Diffusion of Gold in Sputtered Amorphous Silicon | p. 409 |
| Dopant Diffusion and Point Defects in Silicon During Silicidation | p. 415 |
| Lateral Diffusion Couples and Their Contribution to Understanding Thin Film Reactions | p. 421 |
| Diffusion and Defects in Amorphous Silicon | p. 427 |
| EPR Study of Defects Produced by MeV Ion Implantation into Silicon | p. 445 |
| Vacancy Character of Damage Zones in Ion-Irradiated Silicon | p. 451 |
| Multiple Amorphous States in Ion Implanted Semiconductors (Si and InP) | p. 459 |
| The Mechanism of Solid Phase Epitaxy | p. 465 |
| The Amorphous Side of Solid Phase Epitaxy | p. 477 |
| Metal-Enhanced Growth of Silicon | p. 483 |
| Ion-Assisted Phase Transitions in Silicon | p. 501 |
| Ion-Assisted Nucleation in Amorphous Silicon | p. 523 |
| List of Participants | p. 529 |
| Index | p. 535 |
| Table of Contents provided by Blackwell. All Rights Reserved. |