Plasma Technology

Volume 4

By: M. Moisan (Editor), J. Pelletier (Editor)

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Hardcover | 6 November 1992 | Edition Number 2

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Hardcover
540 Pages

Dimensions(cm)
26.04 x 17.78 x 3.18

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The contrasting examples of microwave plasmas given in this volume demonstrate their capability of not only covering the totality of expressed needs in that particular field, but in many others. For example the ions and reactive neutral species, indispensable for the synergetic effects in etching and deposition processes can be used in metallurgical treatment, and for materials processing in general. They also have the ability to dissociate molecules and excite atoms as required in analytical chemistry where the information on the constituent concentrations is obtained through optical spectroscopy or mass spectrometry. Finally, microwave plasmas can supply the photons for laser and lighting applications. It is noteworthy that microwave plasmas cover an impressive pressure range of eight orders of magnitude from 10^-3 Pa (10^-5 torr) to above atmospheric pressure. The versatility of microwave plasmas, their moderate cost, and their ease of implementation particularly appeal to the industrial entrepreneur.

As well as providing a review of current developments, the work proposes a synthesis on microwave discharges, laying out the corresponding physical references without developing too much plasma theory. It will be of interest both to the user, who may not be overly concerned about plasma science, and to the plasma expert, who may wish to redirect his interest towards plasma applications, such as materials processing.

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Introduction
Physical principles of microwave plasma generation
Kinetic modelling of microwave discharges: Influence of the discharge stimulating frequency
Plasmas sustained within microwave circuits
Surface-wave plasma sources
Principles of magnetically assisted microwave discharges
Operation and properties of magnetically assisted high frequency discharges intended for applications
Surface wave sustained plasmas in static magnetic fields for the study of ECR discharge mechanisms
Interest of plasma confinement and its limits
Discharges confined by multipolar magnetic fields
Ambipolar diffusion model of multipolar plasmas
Homogeneity in multipolar discharges: The role of primary electrons
High frequency sustained multipolar plasmas
Distributed electron cyclotron resonance (DECR) plasmas
Applications of microwave plasmas in microcircuit fabrication
Index of symbols
Index
Table of Contents provided by Publisher. All Rights Reserved.

Plasma Technology

Volume 4

At a Glance

Hardcover

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How to return your order

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