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Design for Manufacturability and Yield for Nano-Scale CMOS - Charles Chiang

Design for Manufacturability and Yield for Nano-Scale CMOS

By: Charles Chiang, Jamil Kawa

eText | 15 June 2007

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Design for Manufacturability and Yield for Nano-Scale CMOS walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process and how to address each aspect at the proper design step starting with the design and layout of standard cells and how to yield-grade libraries for critical area and lithography artifacts through place and route, CMP model based simulation and dummy-fill insertion, mask planning, simulation and manufacturing, and through statistical design and statistical timing closure of the design. It alerts the designer to the pitfalls to watch for and to the good practices that can enhance a design's manufacturability and yield. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.
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Non-FictionComputing & I.T.Graphical & Digital Media ApplicationsComputer ScienceComputer Architecture & Logic DesignComputer Programming & Software DevelopmentSoftware EngineeringEngineering & TechnologyEnergy Technology & EngineeringElectrical EngineeringElectronics & Communications EngineeringElectronics Engineering
Circuits & ComponentsElectronic Devices & MaterialsSemi-Conductors & Super-ConductorsTechnology in GeneralNanotechnology

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Paperback

Published: 22nd November 2010

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