Acknowledgements ix
Foreword xi
Preface xiii
1 Fundamentals of Atomic Layer Deposition 1
1.1 Chemical Vapour Deposition 1
1.1.1 Thermal CVD 2
1.1.2 Plasma Enhanced CVD (PECVD) 5
1.2 Vapour Adsorption 6
1.3 Atomic Layer Deposition (ALD) 10
References 29
2 Elemental Semiconductor Epitaxial Films 33
2.1 Epitaxial Silicon 33
References 49
3 III-V Semiconductor Films 51
3.1 Gallium Arsenide 51
3.2 Other III-V Semiconductor Films 63
3.3 Applications 64
References 65
4 Oxide films 67
4.1 Introduction 67
4.2 Aluminum Oxide 68
4.3 Titanium Dioxide 81
4.4 Zinc Oxide 96
4.5 Zirconium Dioxide 101
4.6 Hafnium Dioxide 107
4.7 Other Oxides 112
4.8 Mixed Oxides and Nanolaminates 124
4.9 Multilayers 150
References 151
5 Nitrides and Other Compounds 161
5.1 Introduction 161
5.2 Nitrides 162
5.3 Chalcogenides 176
5.4 Other Compounds 179
References 179
6 Metals 183
6.1 Introduction 183
6.2 Noble Metals 184
6.3 Titanium 193
6.4 Tantalum 196
6.5 Aluminum 198
6.6 Copper 200
6.7 Other Transition Metals 203
References 204
7 Organic and Hybrid Materials 207
7.1 Introduction 207
7.2 Organic layers 208
7.3 Hybrid Organic-inorganic Layers. 209
7.4 Applications of Organic and Hybrid Films 212
References 213
8 ALD Applications and Industry 215
8.1 Introduction 215
8.2 MEMS/NEMS 217
8.3 Thin Film Magnetic Heads 223
8.4 Coating Nanoparticles, Nanomaterials and Porous Objects 224
8.5 Optical Coatings 226
8.6 Thin Film Electroluminescent Displays 228
8.7 Solar Cells 229
8.8 Anti-corrosion Layers 231
8.9 Opportunities in Organic Electronics 234
8.10 ALD Tool Manufacturers and Coating Providers 236
References 238
Index 243
