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Ultraclean Surface Processing of Silicon Wafers : Secrets of VLSI Manufacturing - Takeshi Hattori

Ultraclean Surface Processing of Silicon Wafers

Secrets of VLSI Manufacturing

By: Takeshi Hattori (Editor), T. Hattori (Translator), S. Heusler (Translator), J.P. Webb (Translator)

Hardcover

Published: 17th September 1998
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A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.

Introduction
Contamination and Silicon Device Characteristics
Mechanism of Particle Adhesion onto Silicon Wafer
Technology for Analyzing and Evaluating Silicon Wafer Surfaces (Fundamentals of Analysis and Evaluation Technology)
Making Silicon Wafer Processes Cleaner
Silicon Wafer Cleaning Technologies
Table of Contents provided by Publisher. All Rights Reserved.

ISBN: 9783540616726
ISBN-10: 3540616721
Audience: Professional
Format: Hardcover
Language: English
Number Of Pages: 616
Published: 17th September 1998
Publisher: Springer-Verlag Berlin and Heidelberg Gmbh & Co. Kg
Country of Publication: DE
Dimensions (cm): 24.77 x 15.88  x 3.18
Weight (kg): 1.04