| Review of Optical Data Storage | p. 1 |
| Introduction to Optical Data Storage | p. 1 |
| Compact Discs/Digital Video Discs | p. 2 |
| Magneto-Optical Discs | p. 5 |
| Solid Immersion Lens | p. 5 |
| Holographic Storage | p. 6 |
| Three-Dimensional Bit Optical Storage | p. 8 |
| Three-Dimensional Bit Optical Data Storage | p. 8 |
| Principle of Three-Dimensional Bit Optical Data Storage | p. 8 |
| Single-Photon Versus Two-Photon Excitation | p. 9 |
| Photopolymerization Effect | p. 11 |
| Photobleaching Effect | p. 11 |
| Photochromic Effect | p. 12 |
| Photorefractive Effect | p. 13 |
| Photorefractive Crystals | p. 14 |
| Localized Photorefractive Effect | p. 15 |
| Three-Dimensional Photorefractive Bit Data Storage | p. 16 |
| Conclusions | p. 18 |
| References | p. 18 |
| Two-Step Processes and IR Recording in Photorefractive Crystals | p. 23 |
| Introduction | p. 23 |
| Early Experiments | p. 24 |
| Two-Step Excitation via Shallow Levels | p. 28 |
| Lifetime of the Holograms | p. 32 |
| Advantages of Infrared Recording | p. 34 |
| Conclusions | p. 37 |
| References | p. 37 |
| Gated Optical Recording for Nonvolatile Holography in Photorefractive Materials | p. 41 |
| Introduction | p. 41 |
| Gated Recording in Undoped Stoichiometric Lithium Niobate | p. 43 |
| Doped Stoichiometric Lithium Niobate | p. 49 |
| Material Preparation and Characterization | p. 51 |
| Digital Information Storage Experiment in Two-Photon Photorefractive Material | p. 53 |
| Conclusions | p. 56 |
| References | p. 57 |
| Photorefractive Copper-Doped LiNbO3 Waveguides for Holography Fabricated by a Combined Technique of Ion Exchange and Ion Implantation | p. 59 |
| Introduction | p. 59 |
| Waveguide Fabrication and Characterization | p. 61 |
| Copper Doping by the Exchange Process | p. 62 |
| Photorefractive Properties | p. 63 |
| Method of Characterization | p. 63 |
| Effects of the Combined Copper and Proton Exchange Conditions | p. 64 |
| Effects of the Fabrication Method and Mg Co-doping | p. 66 |
| Holographic Recording | p. 68 |
| Dynamics of Holographic Recording | p. 68 |
| Diffraction Efficiency | p. 70 |
| Discussion and Conclusions | p. 71 |
| References | p. 72 |
| Two-Photon Optical Storage in Photorefractive Polymers in the Near-Infrared Spectral Range | p. 75 |
| Three-Dimensional Bit Optical Data Storage in a Photorefractive Polymer | p. 75 |
| Experimental Recording System | p. 76 |
| Experimental Reading System | p. 78 |
| Transmission Reading | p. 78 |
| Differential Interference Contrast Reading | p. 79 |
| Pulsed Beam Illumination | p. 79 |
| Multi-layered Data Storage | p. 80 |
| Rewritable Data Storage | p. 81 |
| Bit Characterisation | p. 83 |
| Continuous-Wave Illumination | p. 86 |
| Requirements for Two-Photon Excitation with Continuous-Wave Illumination | p. 86 |
| Continuous-Wave Multi-Layered Data Storage | p. 87 |
| Continuous-Wave Rewritable Data Storage | p. 87 |
| Conclusions | p. 89 |
| References | p. 90 |
| Long-Lifetime Photorefractive Holographic Devices via Thermal Fixing Methods | p. 91 |
| Introduction | p. 91 |
| The Photorefractive Effect | p. 92 |
| Photorefractive Fixing Techniques | p. 93 |
| Physical Model for Thermal Fixing | p. 93 |
| Standard Model for LiNbO3 | p. 93 |
| Other Mechanisms | p. 95 |
| Erasure of Fixed Gratings | p. 96 |
| Fixing in Other Materials | p. 96 |
| Mathematical Formulation of the Model | p. 96 |
| General Equations | p. 97 |
| First-Order Equations: Relaxation Modes | p. 98 |
| A Useful Approximate Solution | p. 100 |
| Experimental Data | p. 100 |
| Fixing and Developing Kinetics: Influence of Temperature | p. 101 |
| Diffraction Efficiency of Fixed Gratings | p. 102 |
| Lifetime of Fixed Holograms | p. 102 |
| Optimization of the Fixing Process | p. 103 |
| Volume Holographic Devices | p. 104 |
| Data Storage | p. 104 |
| Very Narrow-Bandwidth Interference Filters and Mirrors | p. 105 |
| Wavelength Demultiplexers | p. 106 |
| Other Devices | p. 106 |
| Waveguide HolographicDevices | p. 106 |
| Summary | p. 107 |
| References | p. 108 |
| Holographic Reflection Filters in Photorefractive LiNbO3 Channel Waveguides | p. 111 |
| Introduction | p. 111 |
| Sample Preparation | p. 113 |
| Holographic Recording and Readout | p. 115 |
| Experimental Results | p. 116 |
| Photorefractive Properties | p. 117 |
| Fundamental Filter Properties | p. 119 |
| Hologram Multiplexing | p. 120 |
| Wavelength Tuning and Electrical Switching | p. 121 |
| Long-Term Stability of Fixed Gratings | p. 122 |
| Conclusions and Outlook | p. 126 |
| References | p. 127 |
| Optical Lambda-Switching at Telecom Wavelengths Based on Electroholography | p. 129 |
| Introduction | p. 129 |
| The Electrically Controlled Bragg Grating | p. 130 |
| The Physical Basis of Electroholography | p. 134 |
| The Voltage-Controlled Photorefractive Effect in the Paraelectric Phase | p. 134 |
| The Voltage-Controlled Photorefractive Effect in KLTN | p. 137 |
| Assessment of the KLTN Crystal as an Electroholographic Medium | p. 138 |
| The Basic Electroholographic Switch Module | p. 141 |
| The Architecture and Operation of the Basic EH Switch Module | p. 141 |
| The Performance Parameters of the Basic EH Switch Module | p. 143 |
| Applications of Electroholographic Switching | p. 152 |
| The Electroholographic Dynamic Optical Add Drop Multiplexer | p. 152 |
| The Electroholographic cross Connect | p. 153 |
| Conclusions | p. 155 |
| References | p. 155 |
| 1550 nm Volume Holographic Devices for Optical Communication Networks | p. 157 |
| Introduction | p. 157 |
| Building the Optical Communication Network | p. 158 |
| The Optical Wavelength Multiplexer/Demultiplexer | p. 159 |
| The Optical Cross-Connect and the Switching Fabric | p. 160 |
| Volume Holography for 1550 nm Optical Device Implementation | p. 160 |
| Recording and Readout of Multiple Holograms | p. 161 |
| Two-Lambda Method | p. 162 |
| Long-Term Lifetime by Thermal Fixing | p. 164 |
| VH-Based Devices for WDM Applications | p. 166 |
| Feasibility of an Optical Wavelength Demultiplexer | p. 166 |
| Feasibility of a WDM-Readable Digital Database | p. 169 |
| Long-Term Reliability of VH-Based Devices | p. 172 |
| High-Dense WDM Device Design | p. 173 |
| Conclusions | p. 176 |
| References | p. 176 |
| Index | p. 179 |
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