The Physics of Micro/Nano-Fabrication

By: Ivor Brodie, Julius J. Muray

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Hardcover | 31 January 1993 | Edition Number 2

At a Glance

Hardcover
676 Pages

Edition Type
Revised

Dimensions(cm)
26.04 x 17.15 x 3.81

Hardcover

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In this revised and expanded edition, the authors provide a comprehensive overview of the tools, technologies, and physical models needed to understand, build, and analyze microdevices. Students, specialists within the field, and researchers in related fields will appreciate their unified presentation and extensive references.

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Preliminary Survey
Microelectronic Devices	p. 2
Planar Processing	p. 11
Microanalysis	p. 38
Microdevices	p. 41
Particle Beams: Sources, Optics, and Interactions
Electron Sources	p. 57
Ion Sources	p. 69
Electron Guns	p. 95
Components for Electron and Ion Optics	p. 121
Electron Interactions	p. 158
Ion Interactions	p. 190
Photon Sources and Interactions	p. 207
Photon Interactions	p. 240
Plasmas: Physics and Chemistry
General Background	p. 259
Collision Processes	p. 265
Electron Motion in a Gas Discharge	p. 272
Collective Phenomena in Plasmas	p. 280
Radio Frequency Glow Discharges	p. 291
Plasma Chemistry	p. 295
Vacuum Physics	p. 297
Layering Technologies
Epitaxy	p. 319
Chemical Vapor Deposition (CVD)	p. 326
Doping by Thermal Diffusion	p. 340
Doping by Ion Implantation	p. 347
Evaporation in Ultrahigh Vacuum	p. 381
Cathodic Sputtering	p. 385
Organic Layer Formation	p. 392
Selective Layer Removal Technologies	p. 399
Thickness and Rate Measurement	p. 404
Laser-Assisted Processes	p. 407
Electron-Beam-Assisted Processes	p. 421
Ion-Beam-Assisted Processes	p. 425
Nucleation and Growth in Layer Formation	p. 436
Pattern Generation
Optical Lithography	p. 455
The Physics of Photoresists	p. 464
Projection Systems	p. 474
Holographic Lithography	p. 475
X-ray Lithography	p. 477
Synchrotron Radiation for X-ray Lithography	p. 487
Electron-Beam Lithography	p. 491
Ion-Beam Lithography	p. 527
Microcharacterization
Parallel Imaging	p. 551
Serial (Scanning) Imaging	p. 565
Limits to Nanofabrication
Limits for MOS Devices	p. 585
Limits for Pattern Generation	p. 591
Nanostructures	p. 605
Appendixes	p. 617
Author Index	p. 625
Subject Index	p. 635
Table of Contents provided by Blackwell. All Rights Reserved.

The Physics of Micro/Nano-Fabrication

At a Glance

Hardcover

Shipping

How to return your order

Defective items

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