The Physical Basis of Ultrahigh Vacuum

By: P.A. Redhead, J.P. Hobson, E.V. Kornelsen

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Paperback | 31 December 1992

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520 Pages

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24.13 x 17.15 x 3.18

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Market: Those involved in the design and use of UHV component systems. Written 25 years ago, this book explains both the design and use of UHV systems and components, as well as the underlying physical principles on which the performance of the equipment depends. Because of its close association of these underlying physical principles with the practical problems inherent in UHV equipment, the book retains its value to this day.

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Non-Fiction Science Science in General Engineering & Technology Technology in General Medicine Medicine in General Physics Applied Physics Electronics & Communications Engineering Electronics Engineering Electronic Devices & Materials

Semi-Conductors & Super-Conductors

Acknowledgements
Introduction	p. 1
Physical Processes
Molecule-Molecule and Molecule-Surface Interactions	p. 11
Energies between Molecules	p. 11
Intermolecular Collisions	p. 18
Energies between a Molecule and a Surface	p. 22
Dynamic Interactions between a Molecule and a Surface	p. 37
Diffusion, Solution and Permeation of Gases in Solids	p. 88
Collision Processes in Gases	p. 110
Elastic Collisions of Electrons with Atoms [actual symbol not reproducible]	p. 111
Inelastic Electron-Atom Collisions	p. 114
Elastic Atom-Atom and Ion-Atom Collisions (00/00, 10/10)	p. 120
Inelastic Effects in Ion-Atom Collisions	p. 123
Photo-absorption and Photo-ionization	p. 128
Positive Ion Recombination	p. 131
Interaction of Charged Particles With Surfaces	p. 134
Electron Scattering from Surfaces	p. 134
Electron-Impact Desorption	p. 167
Impact of Energetic Atoms and Ions on Surfaces	p. 181
Emission of Ions from Hot Surfaces	p. 229
Interaction of Radiation With Surfaces	p. 234
Photo-electric Emission	p. 234
Interaction of Photons with Adsorbed Gases	p. 239
Mechanical Properties of Materials at Very Low Pressures	p. 243
Adhesion or Cold Welding	p. 243
Friction, Lubrication and Wear	p. 246
Creep, Fatigue and Fracture	p. 248
Pressure Measurement
General Considerations of Pressure Measurement	p. 253
Calibration of UHV Gauges	p. 253
Measuring Systems as Sinks and Sources	p. 263
Pressure Measurements in Non-Uniform Environments	p. 281
Residual Currents	p. 287
Methods of Current Measurement	p. 294
Cathodes and Cathode Effects	p. 299
Total Pressure Gauges	p. 304
Hot-Cathode Gauges	p. 304
Crossed-Field, Cold-Cathode Gauges	p. 329
Comparison of Total Pressure Gauges	p. 336
Partial Pressure Gauges	p. 340
Mass-Spectrometers	p. 340
Desorption Spectrometers	p. 355
Gauges using Field Emission or Work-Function Changes	p. 365
Production of Ultrahigh Vacuum
Processing Techniques for Ultrahigh Vacuum	p. 369
Pre-treatment of Materials	p. 371
Baking Procedures	p. 373
Degassing Procedures after Baking	p. 378
Pumps for Ultrahigh Vacuum	p. 379
Molecular Drag and Turbo-Molecular Pumps	p. 379
Diffusion Pumps	p. 380
Cryopumps	p. 383
Getter Pumps	p. 399
Ion Pumps	p. 404
Comparison of Properties of UHV Pumps	p. 416
Examples of Ultrahigh Vacuum Systems	p. 417
Small Glass and Metal Systems	p. 417
Large UHV Systems	p. 430
References	p. 435
Appendix A. Recent References	p. 467
Subject Index	p. 477
Author Index	p. 485
Table of Contents provided by Blackwell. All Rights Reserved.

The Physical Basis of Ultrahigh Vacuum

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