Silicon-on-Insulator (SOI) Technology reviews the past decade of research, presenting developments which have elapsed between the early SOI fabrication techniques and current VLSI and high-speed SOI circuits. The book explains the principles and the physics of SOI materials fabrication and characterization, SOI processing SOI MOSFET device physics, and the use of SOI material in novel device design. The performances of SOI circuits for VLSI/ULSI and for niche applications are also described. The SOI specialist will find this book invaluable as a source of compiled references covering the different aspects of SOI technology. For the non-specialist, the book serves as an excellent introduction to the topic with guidelines for possible future SOI activity. Simple descriptions of the materials, characterization, design, processing and device options are gathered from the literature, and detailed descriptions of the most important areas of SOI technology are presented. Silicon-on-Insulator Technology may also be used as a textbook for students who want to learn more about the fabrication techniques for silicon-on-insulator materials, the specific techniques developed to characterize thin silicon films, the physics of thin-film silicon devices and the potential of SOI and three-dimensional integrated circuits.
Series: The Springer International Engineering and Computer Science
Number Of Pages: 228
Published: 31st March 1991
Publisher: SPRINGER VERLAG GMBH
Country of Publication: US
Dimensions (cm): 24.16 x 16.38
Weight (kg): 0.51