Secondary ion mass spectrometry (SIMS) is a technique used to analyse the composition of solid surfaces and thin films by sputtering the surface of the specimen with a primary ion beam and collecting and analysing ejected secondary ions. The technique has been applied to quality assurance in semiconductor manufacture, in forensics for enhancement of fingerprints and to determine the composition of cometary dust.
This book briefly introduces the fundamentals of the SIMS technique and discusses in detail recent advancements and applications in various branches of science. From an extensive literature review, it provides a good overview of how to reproduce the most prominent experiments and what instruments are required or suited to the analysis. It will inspire new designs and hence research for the future. Appealing to graduates or postgraduates who want an overview of the field and how to use this technique, researchers new to this field will find innovative solutions and how to achieve them detailed herein.
