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Predictive Simulation of Semiconductor Processing : Status and Challenges - Jaroslaw Dabowski

Predictive Simulation of Semiconductor Processing

Status and Challenges

By: Jaroslaw Dabowski (Editor), Eicke R. Weber (Editor)

Hardcover Published: 1st June 2004
ISBN: 9783540204817
Number Of Pages: 490

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Predictive Simulation of Semiconductor Processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool.

From the reviews:

"This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool. Eleven contributions make up the book; each is supported by a wealth of references. ... A valuable reference and guide to have on the shelf for frequent use and study. Certainly, the expertise and research experience of the contributors cannot be questioned. Summing up ... a richly rewarding work." (Current Engineering Practice, Vol. 47 (3), 2004-2005)

Transistors and atomsp. 1
Atomistic simulations of process at surfacesp. 39
Atomistic simulations in materials processingp. 73
Atomistic simulation of decanano MOSFETsp. 111
Modeling and simulation of heterojunction bipolar transistorsp. 157
Gate oxide reliability : physical and computational modelsp. 201
High-K dielectrics : the example of Pr[subscript 2]O[subscript 3]p. 259
Atomistic simulation of Si[subscript 3]N[subscript 4] CVD from dichlorosilane and NH[subscript 3]p. 295
Interconnects and propagation of high frequency signalsp. 357
Modeling of electromigration in interconnectsp. 387
Predictive modeling of transition metal gettering : applications and materials science challengesp. 457
Table of Contents provided by Blackwell. All Rights Reserved.

ISBN: 9783540204817
ISBN-10: 3540204814
Series: Springer Series in Materials Science
Audience: Professional
Format: Hardcover
Language: English
Number Of Pages: 490
Published: 1st June 2004
Publisher: Springer-Verlag Berlin and Heidelberg Gmbh & Co. Kg
Country of Publication: DE
Dimensions (cm): 23.5 x 15.5  x 1.91
Weight (kg): 1.02