
Noncontact Atomic Force Microscopy
By: Roland Wiesendanger, E. Meyer, S. Morita
Hardcover | 24 July 2002
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460 Pages
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| Introduction | p. 1 |
| AFM in Retrospective | p. 1 |
| Present Status of NC-AFM | p. 4 |
| Future Prospects for NC-AFM | p. 8 |
| References | p. 10 |
| Principle of NC-AFM | p. 11 |
| Basics | p. 11 |
| Relation to the Scanning Tunneling Microscope (STM) | p. 11 |
| Atomic Force Microscope (AFM) | p. 15 |
| Operating Modes of AFMs | p. 18 |
| Scanning Speed, Signal Bandwidth and Noise | p. 20 |
| The Four Additional Challenges Faced by AFM | p. 20 |
| Jump-to-Contact and Other Instabilities | p. 21 |
| Contribution of Long-Range Forces | p. 21 |
| Noisein theImagingSignal | p. 22 |
| Non-MonotonicImaging Signal | p. 22 |
| Frequency-Modulation AFM (FM-AFM) | p. 22 |
| Experimental Setup | p. 22 |
| Applications | p. 26 |
| Relation between Frequency Shift and Forces | p. 29 |
| Generic Calculation | p. 29 |
| Frequency Shift for a Typical Tip-Sample Force | p. 32 |
| Calculation of the Tunneling Current for Oscillating Tips | p. 33 |
| Noise in Frequency-Modulation AFM | p. 34 |
| Generic Calculation | p. 34 |
| Noisein theFrequencyMeasurement | p. 34 |
| Optimal Amplitude for Minimal Vertical Noise | p. 38 |
| A Novel Force Sensor Based on a Quartz Tuning Fork | p. 39 |
| Quartz Versus Silicon as a Cantilever Material | p. 39 |
| Benefits in Clamping One of the Beams (qPlus Configuration) | p. 40 |
| Conclusion and Outlook | p. 41 |
| References | p. 43 |
| Semiconductor Surfaces | p. 47 |
| Instrumentation | p. 47 |
| Three-Dimensional Mapping of Atomic Force | p. 48 |
| Control ofAtomic Force | p. 52 |
| Imaging Mechanisms for Si(100)2×1 and Si(100)2×1: H | p. 55 |
| Surface Strain on an Atomic Scale | p. 58 |
| Low Temperature Image of Si(100) Clean Surface | p. 60 |
| Mechanical Control ofAtomPosition | p. 61 |
| Atom Identification Using Covalent Bonding Force | p. 65 |
| Charge Imaging with Atomic Resolution | p. 68 |
| Mechanical Atom Manipulation | p. 74 |
| References | p. 76 |
| Bias Dependence of NC-AFM Images and TunnelingCurrent Variations on Semiconductor Surfaces | p. 79 |
| Experimental Conditions | p. 79 |
| Bias Dependence of NC-AFM Images for Si(111)7×7 | p. 80 |
| MechanismofInvertedAtomicCorrugation | p. 81 |
| NC-AFM Imaging and Tunneling Current | p. 84 |
| NC-AFM Images for Ge/Si(111) | p. 88 |
| Concluding Remarks | p. 91 |
| References | p. 92 |
| Alkali Halides | p. 93 |
| Introduction | p. 93 |
| Experimental Techniques | p. 93 |
| Relevant Forces | p. 94 |
| Imaging of Single Crystals | p. 95 |
| Sample Preparation | p. 95 |
| Atomic Corrugation | p. 96 |
| Imaging of Defects | p. 97 |
| Mixed Alkali Halide Crystals | p. 98 |
| Imaging of Thin Films | p. 98 |
| Preparation of Thin Films | p. 99 |
| Atomic Resolutionat Low-Coordinated Sites | p. 100 |
| Radiation Damage | p. 101 |
| Metallization and Bubble Formation in CaF2 | p. 101 |
| Monatomic Pits in KBr | p. 102 |
| Dissipation Measurements | p. 103 |
| Material and Site-Specific Contrast | p. 104 |
| Using Damping for Distance Control | p. 105 |
| References | p. 106 |
| Atomic Resolution Imaging on Fluorides | p. 109 |
| Experimental Techniques | p. 110 |
| Tip Instabilities | p. 111 |
| Flat Surfaces | p. 115 |
| Step Edges | p. 119 |
| References | p. 122 |
| Atomically Resolved Imaging of a NiO(001) Surface | p. 125 |
| Antiferromagnetic Nickel Oxide | p. 125 |
| ExperimentalConsiderations | p. 127 |
| Morphology ofthe Cleaved Surface | p. 128 |
| Atomically Resolved Imaging UsingNon-CoatedandFe-CoatedSiTips | p. 129 |
| Short-Range Magnetic Interaction | p. 130 |
| Analysis ofthe Cross-Section | p. 131 |
| Conclusion | p. 133 |
| References | p. 134 |
| Atomic Structure, Order and Disorder on High Temperature Reconstructed -Al2O3(0001) | p. 135 |
| TheCleanSurface | p. 137 |
| Defect Formation upon Water Exposure | p. 139 |
| Self-Organized Formation of Nanoclusters | p. 141 |
| References | p. 143 |
| NC-AFM Imaging of Surface Reconstructions and Metal Growth on Oxides | p. 147 |
| Introduction | p. 147 |
| 1×1 to 1×3 Phase Transition of TiO2(100) | p. 148 |
| Surface Reconstructions of TiO2(110) | p. 151 |
| The 1×2 Reconstruction of SnO2(110) | p. 154 |
| Imaging Thin Film Alumina: NiAl(110)-Al2O3 | p. 155 |
| Growth of Cu and Pd on -Al2O3(0001)- <$$> | p. 158 |
| A Short-Range-Ordered Overlayer of K on TiO2(110) | p. 160 |
| Conclusions | p. 162 |
| References | p. 163 |
| Atoms and Molecules on TiO2(110) and CeO2(111) Surfaces | p. 167 |
| Background | p. 167 |
| Brief Description of Experiments | p. 168 |
| Surface Structures of TiO2(110) | p. 169 |
| Adsorbed Atoms and Molecules on TiO2(110) | p. 170 |
| Carboxylate Ions on TiO2(110) | p. 170 |
| Hydrogen Adatoms on TiO2(110) | p. 172 |
| Fluctuation ofAcetate Ions on TiO2(110) | p. 173 |
| Surface Structures of CeO2(111) | p. 175 |
| Conclusions | p. 178 |
| References | p. 179 |
| NC-AFM Imaging of Adsorbed Molecules | p. 183 |
| NucleicAcidBasesonaGraphiteSurface | p. 183 |
| Double-StrandedDNAonaMicaSurface | p. 187 |
| Alkanethiol on a Au(111) Surface | p. 189 |
| References | p. 191 |
| Organic Molecular Films | p. 193 |
| AFM Imaging of Molecular Films | p. 194 |
| Fullerenes | p. 195 |
| AlkanethiolSAMs | p. 198 |
| Ferroelectric Molecular Films | p. 200 |
| Surface Potential Measurements | p. 204 |
| Technical Developments in NC-AFM Imaging ofMolecules | p. 209 |
| Concluding Remarks | p. 211 |
| References | p. 212 |
| Single-Molecule Analysis | p. 215 |
| Introduction | p. 215 |
| Molecules and Surface | p. 216 |
| Experimental Methods | p. 217 |
| Alkyl-Substituted Carboxylates | p. 218 |
| Numerical Simulation ofPropiolate Topography | p. 221 |
| Sphere-Substrate Force | p. 223 |
| Sphere-Carboxylate Force | p. 223 |
| Cluster-Substrate Force | p. 224 |
| Cluster-Carboxylate Force | p. 224 |
| Simulated Topography | p. 224 |
| Fluorine-Substituted Acetates | p. 226 |
| Conclusions and Perspectives | p. 229 |
| References | p. 230 |
| Low-Temperature Measurements: Principles, Instrumentation, and Application | p. 233 |
| Introduction | p. 233 |
| Microscope Operation at Low Temperatures | p. 234 |
| Drift | p. 234 |
| Noise | p. 236 |
| Instrumentation | p. 237 |
| Van der Waals Surfaces | p. 239 |
| HOPG(0001) | p. 240 |
| Xenon | p. 241 |
| Nickel Oxide | p. 242 |
| Semiconductors | p. 244 |
| f(z) Curves on Specific Atomic Sites | p. 244 |
| Tip-Dependent Atomic Scale Contrast | p. 246 |
| Tip-Induced Relaxation | p. 248 |
| Magnetic Force Microscopy at Low Temperatures | p. 249 |
| MFM Data Acquisition | p. 249 |
| Domain Structure of La0.7Ca0.3MnO3- | p. 250 |
| Vortices on YBa2Cu3O7- | p. 251 |
| Conclusions | p. 252 |
| References | p. 253 |
| Theory of Non-Contact Atomic Force Microscopy | p. 257 |
| Introduction | p. 257 |
| Cantilever Dynamics | p. 259 |
| Theoretical Simulation of NC-AFM Images | p. 262 |
| Non-Contact Atomic Force Microscopy Images ofDynamic Surfaces | p. 267 |
| Effect of Tip on Image for the Si(100)2×1: H Surface | p. 270 |
| Effect of Tip on Surface Structure Change and its Relation to Dissipation | p. 274 |
| Conclusion and Outlook | p. 277 |
| References | p. 278 |
| Chemical Interaction in NC-AFM on Semiconductor Surfaces | p. 279 |
| Introduction | p. 279 |
| First-Principles Calculation of Tip-Surface Chemical Interaction | p. 280 |
| Simulation of NC-AFM Images | p. 281 |
| Simulations on Various Surfaces | p. 284 |
| Tip-Induced Surface Relaxation on the GaAs(110) Surface | p. 286 |
| Vertical Scan Over an As Atom | p. 286 |
| Vertical Scan Over a Ga Atom | p. 288 |
| RelevancetoNear-Contact STM Observations | p. 291 |
| Tip-Induced Surface Atomic Processes and EnergyDissipation in NC-AFM | p. 293 |
| Image Contrast on GaAs(110) for a Pure Si Tip: Distance Dependence | p. 293 |
| Effect of Tip Morphology on NC-AFM Images | p. 297 |
| Image Contrast for the Ga/Si Tip | p. 299 |
| Image Contrast for the As/Si Tip | p. 301 |
| Conclusion | p. 302 |
| References | p. 303 |
| Contrast Mechanisms on InsulatingSurfaces | p. 305 |
| Introduction | p. 305 |
| Model ofAFM and Main Forces | p. 306 |
| Tip-Surface Setup | p. 306 |
| Forces | p. 307 |
| Simulating Scanning | p. 313 |
| TheSurface | p. 313 |
| TheTip | p. 314 |
| Tip-Surface Interaction | p. 317 |
| Modelling Oscillations | p. 319 |
| Generating a Theoretical Surface Image | p. 320 |
| Applications | p. 320 |
| The Calcium Fluoride (111) Surface | p. 322 |
| Calcite: Surface Deformations During Scanning | p. 336 |
| Studying Surface and Defect Properties | p. 341 |
| Conclusions | p. 343 |
| References | p. 344 |
| Analysis of Microscopy and Spectroscopy Experiments | p. 349 |
| Introduction | p. 349 |
| BasicPrinciples | p. 349 |
| Experimental Setup | p. 349 |
| Origin ofthe Frequency Shift | p. 351 |
| Calculation ofthe FrequencyShift | p. 352 |
| Frequency Shift for Conservative Tip-Sample Forces | p. 354 |
| Simulation of NC-AFM Images | p. 355 |
| Experimental NC-AFM Images of van der Waals Surfaces 355 | |
| BasicPrinciplesoftheSimulationMethod | p. 358 |
| Applications ofthe Simulation Method | p. 360 |
| Dynamic Force Spectroscopy | p. 362 |
| Determining Forces fromFrequencies | p. 362 |
| Analysis ofTip-Sample Interaction Forces | p. 366 |
| Conclusion | p. 367 |
| References | p. 368 |
| Theory of Energy Dissipation into Surface Vibrations | p. 371 |
| Introduction | p. 371 |
| Possible Dissipation Mechanisms | p. 372 |
| Adhesion Hysteresis | p. 372 |
| Stochastic Dissipation | p. 375 |
| Other Mechanisms | p. 375 |
| Brownian Particle MechanismofEnergy Dissipation | p. 375 |
| Brownian Particle | p. 375 |
| Fluctuation-Dissipation Theorem | p. 377 |
| Oscillating Tip as a Brownian Particle | p. 378 |
| Energy Dissipated Per Oscillation Cycle | p. 380 |
| Nonequilibrium Considerations for NC-AFM Systems | p. 382 |
| Preliminary Remarks | p. 382 |
| Mixed Quantum-Classical Representation | p. 383 |
| Equation ofMotion for the Tip | p. 385 |
| Estimation ofDissipation Energies in NC-AFM | p. 388 |
| Comparison with STM | p. 391 |
| Conclusions and Future Directions | p. 392 |
| References | p. 393 |
| Measurement of Dissipation Induced by Tip-Sample Interactions | p. 395 |
| Introduction | p. 395 |
| Experimental Aspects of Energy Dissipation | p. 396 |
| ExperimentalMethods | p. 398 |
| ApparentEnergyDissipation | p. 399 |
| Velocity-DependentDissipation | p. 404 |
| Electric-Field-MediatedJouleDissipation | p. 405 |
| Magnetic-Field-MediatedJouleDissipation | p. 408 |
| Magnetic-Field-MediatedDissipation | p. 409 |
| Brownian Dissipation | p. 412 |
| Hysteresis-Related Dissipation | p. 413 |
| Magnetic-Field-Induced Hysteresis | p. 413 |
| Hysteresis Due to Adhesion | p. 415 |
| Hysteresis Due to Atomic Instabilities | p. 416 |
| DissipationImagingwithAtomicResolution | p. 419 |
| DissipationSpectroscopy | p. 426 |
| Conclusion | p. 429 |
| References | p. 429 |
| Index | p. 433 |
| Table of Contents provided by Publisher. All Rights Reserved. |
ISBN: 9783540431176
ISBN-10: 3540431179
Series: Nanoscience and Technology
Published: 24th July 2002
Format: Hardcover
Language: English
Number of Pages: 460
Audience: College, Tertiary and University
Publisher: Springer Nature B.V.
Country of Publication: DE
Dimensions (cm): 23.5 x 15.88 x 2.54
Weight (kg): 0.77
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