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Nanolithography : A Borderland Between Stm, Eb, Ib, and X-Ray Lithographies - Massimo Gentili


A Borderland Between Stm, Eb, Ib, and X-Ray Lithographies

By: Massimo Gentili (Editor), Carlo Giovannella (Editor), Stefano Selci (Editor)

Hardcover Published: 30th April 1994
ISBN: 9780792327943
Number Of Pages: 216

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Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography.
Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).

Nanolithography, The Integrated Systemp. 1
Electron Beam Resists and Pattern Transfer Methodsp. 13
Nanolithography Developed Through Electron-Beam-Induced Surface Reactionp. 25
Direct Writing of Nanoscale Patterns in SiO[subscript 2]p. 45
Sub-10 nm Electron Beam Lithography: -AlF-Doped Lithium Fluoride as a Resistp. 53
Surface Imaging for EB-Nanolithographyp. 67
Patterning of InGaAs/GaAs Quantum Dots Using E-Beam Lithography and Selective Removal of the Top Barrierp. 73
Fabrication of Ultrasmall InGaAs/InP Nanostructures by High Voltage Electron Beam Lithography and Wet Chemical Etchingp. 77
Fabrication, Investigation and Manipulation of Artificial Nanostructuresp. 81
Nano-Lithography in 3 Dimensions with Electron Beam Induced Depositionp. 87
Nanolithography Requirements - An Equipment Manufacturers Viewp. 95
X-Ray Nanolithography: Limits, and Applications to Sub-100 nm Manufacturingp. 103
X-Ray Phase Shifting Masksp. 121
Fabrication X-Ray Mask for Nanolithography by EBLp. 129
Intense Focused Ion Beams for Nanostructurisationp. 137
Latest Results Obtained with the Alpha Ion Projection Machinep. 149
Direct Writing with a Combined STM/SEM Systemp. 159
Low Voltage E-Beam Lithography with the Scanning Tunneling Microscopep. 175
STM Nanolithography and Characterization of Passivated Silicon and Gallium Arsenidep. 189
Sub-20 nm Lithographic Patterning with the STMp. 197
Lithography of [actual symbol not reproducible] Superconducting Thin Films with a Scanning Tunneling Microscopep. 207
Author Indexp. 213
Subject Indexp. 215
Table of Contents provided by Blackwell. All Rights Reserved.

ISBN: 9780792327943
ISBN-10: 0792327942
Series: Astrophysics and Space Science Library
Audience: General
Format: Hardcover
Language: English
Number Of Pages: 216
Published: 30th April 1994
Country of Publication: NL
Dimensions (cm): 23.39 x 15.6  x 1.42
Weight (kg): 0.5