+612 9045 4394
 
CHECKOUT
$7.95 Delivery per order to Australia and New Zealand
100% Australian owned
Over a hundred thousand in-stock titles ready to ship
Ion Implantation : Basics to Device Fabrication - Emanuele Rimini

Ion Implantation

Basics to Device Fabrication

Hardcover Published: 31st December 1994
ISBN: 9780792395201
Number Of Pages: 393

Share This Book:

Hardcover

$338.87
or 4 easy payments of $84.72 with Learn more
Ships in 15 business days

Earn 678 Qantas Points
on this Book

Other Available Editions (Hide)

  • Paperback View Product Published: 23rd February 2014
    Ships in 15 business days
    $338.87

Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics. As the major or the unique procedure to selectively dope semiconductor materials for device fabrication, ion implantation takes advantage of the tremendous development of microelectronics and it evolves in a multidisciplinary frame. Physicists, chemists, materials sci­ entists, processing, device production, device design and ion beam engineers are all involved in this subject. The present monography deals with several aspects of ion implantation. The first chapter covers basic information on the physics of devices together with a brief description of the main trends in the field. The second chapter is devoted to ion im­ planters, including also high energy apparatus and a description of wafer charging and contaminants. Yield is a quite relevant is­ sue in the industrial surrounding and must be also discussed in the academic ambient. The slowing down of ions is treated in the third chapter both analytically and by numerical simulation meth­ ods. Channeling implants are described in some details in view of their relevance at the zero degree implants and of the available industrial parallel beam systems. Damage and its annealing are the key processes in ion implantation. Chapter four and five are dedicated to this extremely important subject.

Preface
List of Tables
Semiconductor Devices
Ion Implanters
Range Distribution
Radiation Damage
Annealing and Secondary Defects
Analytical Techniques
Silicon Based Devices
Ion Implantation in Compound Semi-Conductor and Buried Layer Synthesis
Selected References
References
Index
Table of Contents provided by Blackwell. All Rights Reserved.

ISBN: 9780792395201
ISBN-10: 0792395204
Series: The Springer International Engineering and Computer Science
Audience: General
Format: Hardcover
Language: English
Number Of Pages: 393
Published: 31st December 1994
Publisher: SPRINGER VERLAG GMBH
Country of Publication: US
Dimensions (cm): 23.39 x 15.6  x 2.39
Weight (kg): 0.74

Earn 678 Qantas Points
on this Book