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Handbook of Plasma Processing Technology : Fundamental, Etching, Deposition and Surface Interactions :  Fundamental, Etching, Deposition and Surface Interactions - Stephen M. Rossnagel

Handbook of Plasma Processing Technology : Fundamental, Etching, Deposition and Surface Interactions

Fundamental, Etching, Deposition and Surface Interactions

Hardcover

Published: June 1990
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This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.

"The text provides and excellent reference for plasma processing." - SAMPE Journal

Techniques for IC Processing
Introduction to Plasma Concepts and Discharge Configurations
Fundamentals of Sputtering and Reflection
Bombardment-Induced Compositional Changes with Alloys, Oxides, Oxysalts, and Halides
RF Diode Sputter Etching and Deposition
Magnetron Plasma Deposition Processes
Broad-Beam Ion Source
Reactive Ion Etching
Reactive Sputter Deposition
Plasma Enhanced Chemical Vapor Deposition of Thin Films for Microelectronics
Electron Cyclotron Resonance Microwave Discharges for Etching and Thin Film Deposition
Hollow Cathode Etching and Deposition
Ion Plating
Ionized Cluster Beam (ICB) Deposition Techniques
The Activated Reactive Evaporation (ARE) Process
Formation of Thim Films by Remote Plasma Enhanced Chemical Vapor Deposition (Remote PECVD)
Selective Bias Sputter Deposition
Vacuum Arc-Based Processing
Ion Source Interactions: General Understandings
Ion Assisted Deposition
Microstructural Control of Plasma-Sputtered Refractory Coatings
Table of Contents provided by Publisher. All Rights Reserved.

ISBN: 9780815512202
ISBN-10: 0815512201
Series: Materials Science and Process Technology
Audience: Professional
Format: Hardcover
Language: English
Number Of Pages: 546
Published: June 1990
Country of Publication: US
Dimensions (cm): 23.34 x 16.18  x 3.15
Weight (kg): 0.82