
Handbook of Chemical Vapor Deposition
Principles, Technology and Applications
By: Hugh O. Pierson
Hardcover | 1 January 1992
At a Glance
458 Pages
22.86 x 15.24 x 2.54
Hardcover
$334.99
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Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors.
This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
ISBN: 9780815513001
ISBN-10: 0815513003
Series: CVD : PRINCIPLES, TECHNOLOGY, AND APPLICATIONS
Published: 1st January 1992
Format: Hardcover
Language: English
Number of Pages: 458
Audience: Professional and Scholarly
Publisher: WILLIAM ANDREW INC
Country of Publication: US
Dimensions (cm): 22.86 x 15.24 x 2.54
Weight (kg): 0.78
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