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A graduate-level description of recent Japanese research on the chemistry of amorphous silicon film deposition associated with plasma CVD, a step in producing amorphous semiconductors. Reports on studies (of microscopic processes of gas-phase reaction as well as chemical reactions on the film growin
ISBN: 9780792303091 ISBN-10: 0792303091 Series: Advances in Solid State Technology Audience:
Number Of Pages: 277 Published: 30th November 1989 Publisher: Springer Country of Publication: NL Dimensions (cm): 23.4 x 15.6
Weight (kg): 1.3