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Glow-Discharge Hydrogenated Amorphous Silicon : Advances in Solid State Technology - K. Tanaka

Glow-Discharge Hydrogenated Amorphous Silicon

By: K. Tanaka

Hardcover | 30 November 1989

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A graduate-level description of recent Japanese research on the chemistry of amorphous silicon film deposition associated with plasma CVD, a step in producing amorphous semiconductors. Reports on studies (of microscopic processes of gas-phase reaction as well as chemical reactions on the film growin

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