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Chemical Vapour Deposition : Principles and Applications - Michael L. Hitchman

Chemical Vapour Deposition

Principles and Applications

By: Michael L. Hitchman (Editor), K. F. Jensen (Editor), M. L. Hitchman (Editor)

Hardcover Published: 27th April 1993
ISBN: 9780123496706
Number Of Pages: 677

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This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.

Principles and Applications
Chemical Vapour Deposition--An Overview
Fundamentals of Chemical Vapour Deposition
Analysis of Chemical Vapor Deposition Processes
Chemical Vapor Deposition at Low Pressures
Silicon Epitaxy by Chemical Vapor Deposition
Organometallic Vapor Phase Epitaxy of III-V Materials
Plasma-Assisted Chemical and Vapor Deposition
Photo-Assisted Chemical Vapor Deposition
Electronic and Optical Characterization of Chemical Vapor Deposition Films for Device Applications
Protective Coatings
Index
Table of Contents provided by Publisher. All Rights Reserved.

ISBN: 9780123496706
ISBN-10: 0123496705
Audience: Professional
Format: Hardcover
Language: English
Number Of Pages: 677
Published: 27th April 1993
Publisher: ACADEMIC PR INC
Country of Publication: GB
Dimensions (cm): 23.39 x 15.6  x 3.66
Weight (kg): 1.13

Earn 1995 Qantas Points
on this Book