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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications : Materials Science and Process Technology - John E. J. Schmitz

Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications

Materials Science and Process Technology

Hardcover

Published: February 1992
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This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments and applications are described.

"After reading this book, an engineer should have all the necessary background." - European Semiconductor

Introduction
The Blanket Tungsten Approach
The Selective Tungsten Approach
Blanket Versus Selective Tungsten
Tungsten as Interconnect Material
The Chemistry of CVD-W and Properties of Tungsten
The Deposition Equipment
Miscellaneous
Chemical Vapor Deposition of Tungsten Silicide
References
Author Index
Subject Index
Appendix: Unit Cells of W and WSi2
Table of Contents provided by Publisher. All Rights Reserved.

ISBN: 9780815512882
ISBN-10: 0815512880
Series: Materials Science and Process Technology
Audience: Professional
Format: Hardcover
Language: English
Number Of Pages: 251
Published: February 1992
Country of Publication: US
Dimensions (cm): 23.52 x 15.65  x 1.83
Weight (kg): 0.48