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Evolution of Thin-film and Surface Structure and Morphology

Volume 355

By: B. M. Clemens (Editor), J. J. Cuomo (Editor), B. G. Demczyk (Editor), Eric Garfunkel (Editor), E. D. Williams (Editor)

Hardcover

Published: 18th July 1995
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The evolution of thin-film and surface structure impacts significantly on a number of high-technology areas involving the electronics, electro-optics, magnetic data storage, petrochemical and polymer industries, among others. This volume draws together researchers working in the areas of surface structure, dynamics and growth characterization, to identify common interest areas and to promote interdisciplinary interaction. Topical emphasis is centered on the information content derived, rather than the specific materials involved.

Preface
Acknowledgments
Materials Research Society Symposium Proceedings
Surface Energy Driven Crystallization of Amorphous [actual symbol not reproducible] Alloyp. 3
Structure, Morphology and Evolution of Interfaces in Si/Si[subscript 1-x]Ge[subscript x] Superlatticesp. 9
Surface Diffusion of Large Ag Clusters on Ag(100)p. 15
Atomic Force Microscopy and Raman Spectroscopy Study of Strain Relaxation in InGaAs on GaAs(100) Grown by Chemical Beam Epitaxy Using Unprecracked Monoethylarsinep. 21
Manipulation of Nucleation During Si Molecular Beam Epitaxyp. 27
Structural Evolution or Rapid Thermal Carbonized Si Surfacesp. 33
Pulsed Laser Deposition and Characterization of Novel Cu/TiN/Si(100) Heterostructures Grown Via Domain Epitaxyp. 39
Growth Morphology of Vicinal Hillocks on the {101} Face of KH[subscript 2]PO[subscript 4]: Evidence of Surface Diffusionp. 45
The Morphology of Cu Clusters on SrTiO[subscript 3](001) at Initial Stages of Metal Film Growthp. 51
Microstructural Evolution During the Epitaxial Growth of Ag/InP (100)p. 59
Structural Evolution of Highly Crosslinked Polymer Networksp. 65
Morphology of Thin Filmsp. 71
Nucleation and Growth of CVD Si Thin Films: AFM, SE and TEM Analysisp. 77
Probing the Nucleation of a Thin Metal Film: Atom Deposition Vs. Cluster Beam Depositionp. 83
Morphology and Step Coverage of In-Situ Doped Polysilicon Films Deposited by Single Wafer CVDp. 89
Microstructural Evolution of Ag/GaAs (110)p. 95
Growth Morphology of Ag Islands on GaAs (110) at Low Coverage: Monte Carlo Simulationsp. 101
Patterns of Competitive Crystal Growthp. 107
A Dynamic View of Step Configurations on Ag(110) and Their Role in the Formation of Oxygen Overlayersp. 115
Epitaxial Growth of Metastable Sn[subscript x]Ge[subscript 1-x] Alloy Films by Ion-Assisted Molecular Beam Epitaxyp. 123
Morphology Maps of Small Particlesp. 135
Structure of Nanophase Gold Particles on Iron Oxide Supportsp. 141
Using Atomic Force Microscopy to Image Langmuir Blodgett Films of Disk Shaped Moleculesp. 147
A Soft Incommensurate Reconstruction on Pb/Si(111)p. 153
Measuring Vacancy Diffusivity and Vacancy Assisted Clustering by Nitridation Enhanced Diffusion of Sb in Si(100) Doping Superlatticesp. 157
Co[subscript 3]O[subscript 4] Epitaxial Formation on CoO(100)p. 163
Tetragonal Au-Ni (001) Solid Solutions Grown by MBEp. 169
Microstructure and Reconstruction of LaAlO[subscript 3] {100} and {110} Surfacesp. 175
Atomic Imaging of Metal-Semiconductor Surfaces Using UHV-HREM and Diffractionp. 181
Nanofabrication of Materials with a Scanning Tunneling Microscopep. 191
Surface and Defect Structure of Epitaxial Gallium Phosphide on Si(001)p. 197
Step-Step Interactions on the Vicinal Ge(001) Surfacep. 203
Characterization of Sputtered Cerium Dioxide Thin Filmsp. 209
Crystalline Perfection of Semiconductor Surfaces by X-Ray Multiple Diffractionp. 215
SFM Studies of the Surface Morphology of Icep. 221
Molecular Dynamics Study of Disordering and Premelting of the Pb(110) Surfacep. 227
Role of Surface Steps in Thin Film Growth and Properties Studied by Leemp. 235
In-Situ Scanning Probe Microscopy of Solid-Liquid Interfaces: Role of Epitaxial Oxide Adlayers on Cu Electrodepositionp. 247
Probing Biopolymer Films with Scanning Force Methodsp. 253
Reconstruction from an Oxidized Si(111) Surface Studied by High-Temperature STMp. 259
Monte Carlo Simulation of a Growing Pb-Film on Cu (100) and (111) Surfacesp. 263
Interface Morphology of RF-Sputtered Nb/Al[subscript 2]O[subscript 3] Multilayers Studied by X-Ray Reflectivity and Diffuse Scatteringp. 269
Structure of the Annealed Au-Si(100) System: A UHV-HREM Studyp. 275
Atomic Structure of Ultrathin Erbium Silicides on Si(111)p. 281
Ambient and High Temperature STM Investigations of the Growth of Titanium Silicide on Silicon Substratesp. 287
Structural Characterization of Ga on Si(112) by Auger Electron Diffractionp. 293
Roughness Analysis of Si[subscript 1-x]Ge[subscript x] Filmsp. 301
Magnetic Force Microscopy: Recent Advances and Applicationsp. 311
Step Coverage and Material Properties of CVD Titanium Nitride Films from TDMAT and TDEAT Organic Precursorsp. 323
Validation of the Modelling of a Solid-Liquid Reaction by a Solid-Vapor Reactionp. 329
Orientation Selection and Microstructural Evolution of Epitaxial Pt Films on (001) MgOp. 335
Comparison of Properties of CVD Copper Films Deposited on Different Substrate Materialsp. 341
Preferred Orientation and Magnetic Properties of Barium Hexaferrite Thin Films Devitrified from the Glassp. 347
Evaluation of Surface Characteristics of ZnS and Zn[subscript 2]SiO[subscript 4] Powders by SFMp. 353
A Comparison of the Physical Properties of Cluster-Based and Vacuum-Evaporated Thin Metal Filmsp. 359
Evolution of Microstructure During Low-Temperature Solid Phase Epitaxial Growth of Si[subscript x]Ge[subscript 1-x] on Si(001)p. 365
Spectral Sensitivities of X-Ray Diffraction and Atomic Force Microscopy to the Roughness of Si/SiO[subscript 2] Interfacesp. 373
Surface Roughness Investigation of Thin SiO[subscript 2] Films Deposited from N[subscript 2]O and SiH[subscript 4]p. 377
Wear Resistance of Pearlitic Steel Microstructuresp. 383
Surface Roughness and Specific Contact Resistance of AuGeNi/InP Ohmic Contactsp. 389
Dynamic Surface Evolution of Sputtered Cu-Coatings: A Quantification of Surface Diffusion Effects by AFMp. 395
Study of Surface Structure, Morphology and Hardness of Several Different Diamond-Like Carbon Filmsp. 401
Dissolution of CaCO[subscript 3](1014) Surfacep. 409
Tungsten Silicide Stability and Interface Reaction Determined by Modeling and Experimentsp. 415
A Model for Oxide Film Evolution on Alloys and Prediction of Resulting Layer Structurep. 421
Phase Transformations in a-Si/Ni/c-Si Structures with Different Interfacial Ni Layer Thicknessesp. 427
An HREM Study of the Microstructure of A1 Contact on GaN/AlN/SiC Thin Filmsp. 433
Comparison of Amorphous and Polycrystalline Tungsten Nitride Diffusion Barrier for MOCVD-Cu Metallizationp. 441
Characterization and Annealing of Sputtered AlN Films for Piezoelectric Resonatorsp. 447
Mechanism of Facet Formation During Epitaxial CoSi[subscript 2] Growth Using Co/Refractory Bilayersp. 453
Amorphous Ti-Si-N Barrier Metal for Cu Metallization on ULSIsp. 459
Epitaxial TiSi[subscript 2] Growth on Si(100) from Reactive Sputtered TiN[subscript x] and Subsequent Annealingp. 465
Microstructure and Interfacial Reactions in RuO[subscript 2]/Ta[subscript 2]N Precision Thin Film Resistorsp. 471
High Resolution Microscopy of Pd/InP Interfacesp. 477
Characterization of Tantalum Oxide Thin Film and Its Electrodes for DRAM's Capacitor Applicationp. 483
Microstructures of Tungsten Silicide Films Deposited by CVD and by Sputteringp. 491
Structural-Chemical Properties of InP Own Oxidesp. 497
Condition of Interface: Anodic Oxide - A[superscript 3]B[superscript 3] Semiconductorp. 503
Surface Structure and Morphology of CdS Thin Films Deposited by Spray Pyrolysisp. 507
Epitaxial Formation and Characterization of CeO[subscript 2] Filmsp. 513
XPS Study of Sub-Monolayer Native Oxide on HF-Treated Si Surfacesp. 519
Characterization of the Degradation Processes in the Buried Heterostructure Quantum Well Laser Diodes Using Internal Second Harmonic Emissionp. 525
Surface Alloy Phases of Immiscible Metals: A Semiempirical Study of Au Growth on Ni(110)p. 531
A Model for Low-Resistivity TiSi[subscript 2] Formation on Narrow Polysilicon Linesp. 539
Influence of Interface Roughness Scattering on Electron Mobility in GaAs-Al[subscript 0.3]Ga[subscript 0.7]As Two Dimensional Electron Gas (2DEG) Heterostructuresp. 545
Ceramic Coatings in Pump Manufacturingp. 551
ZrO[subscript 2] and [actual symbol not reproducible] Phase Structure in Films and Powdersp. 557
RF Aerosol Mist Plasma Deposition of Oxide Filmsp. 563
Elastic Misfit Strain Relaxation in Highly Strained InAs Dots on GaAs as Studied by TEM, AFM and VFF Atomistic Calculationsp. 569
Modeling of Collimated Titanium Nitride Physical Vapor Deposition Using a Combined Specular-Diffuse Formulationp. 575
Very Low Temperature Deposition of Polycrystalline Silicon Films with Micro-Meter-Order Grains on SiO[subscript 2]p. 581
ZnO:In Thin Films Prepared with Different Precursor Salts by Spray Pyrolysis and Studied by Electron Microscopyp. 587
Capillary Instabilities in Cobalt Silicide Thin Filmsp. 593
Surface Topography of Cocondensed Amorphous ZrCo-Alloy Films Investigated in situ by UHV-STMp. 601
Grain Growth Behavior of Bismuth Titanate Thin Film on Metallic Silicon Substratesp. 607
Microstructure and Surface Morphology of Ag and Au Films Grown on Hydrogen-Terminated Si(111) Substratesp. 613
Structural Evolution of Highly Crosslinked Polymer Networksp. 619
Direct Sub-Lattice Imaging of Interface Dislocation Structures in CdTe/GaAs(001)p. 625
The Effect of Si on TiAl[subscript 3] Formation in Ti/Al Alloy Bilayersp. 631
Effects of Rapid Thermal Annealing on Heavily Boron Doped Silicon Epitaxial Layersp. 637
Computer Simulation of Surface Diffusion of Copper on Copper (111) and (100) Surfacesp. 643
Reduction of Defects in Highly Lattice Mismatched InGaAs Grown on GaAs by MOCVDp. 649
Defect-Free GaAs CAP Layer on Aluminum Oxide Generated by Thermal Oxidation of AlAsp. 655
Author Indexp. 661
Subject Indexp. 665
Table of Contents provided by Blackwell. All Rights Reserved.

ISBN: 9781558992566
ISBN-10: 1558992561
Series: Materials Research Society Symposium Proceedings (Hardcover)
Audience: Professional
Format: Hardcover
Language: English
Number Of Pages: 668
Published: 18th July 1995
Publisher: CAMBRIDGE UNIV PR
Dimensions (cm): 23.368 x 16.002  x 4.064
Weight (kg): 1.066