By: Bernard M. Gallois (Editor), Woo Young Lee (Editor), Michael A. Pickering (Editor)

Hardcover

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CVD (chemical vapor deposition) technology is receiving much interest in the scientific community, in particular for synthesizing new materials with tailored chemical composition and physical properties that offer multiple functionality. Multiphase or multilayered films, functionally graded materials (FGMs), "smart" material structures and nanocomposites are just a few examples of the new classes of materials being produced via CVD. This third volume in the series from MRS offers an interdisciplinary perspective on technological issues relevant to CVD materials and processes, and provides a forum for the exchange of new scientific results. Topics include: fundamentals, modeling and diagnostics; process/microstructure/property relationships; diamond, cubic boron nitride and related materials; organometallic chemical vapor deposition and novel approaches.

Preface
Acknowledgments
Materials Research Society Symposium Proceedings
Understanding and Improving Materials Processing Through Interpreting and Manipulating Predictive Models	p. 3
The Modeling Routes for the Chemical Vapor Deposition Process	p. 15
The Decomposition of Methyltrichlorosilane in Hydrogen and Helium	p. 27
Dynamic Modelling of CVD for Real-Time Control of Microstructure	p. 33
Modeling the Gas-Phase Chemistry of Silicon Carbide Formation	p. 39
Ellipsometric Investigation of Metal-Organic Chemical Vapor Deposition of Niobium Oxide Films	p. 45
Visualization of Atmospheric Pressure Chemical Vapor Deposition and Powder Spray Pyrolysis by Laser Light Scattering	p. 51
Intelligent Process Control of Silicon Nitride Chemical Vapor Deposition	p. 57
Rate of SiC Deposition from Methyltrichlorosilane and Influence of HCL Addition	p. 63
Chemical Vapor Deposited [beta]-SiC for Optics Applications	p. 71
MOCVD of Yttria Stabilized Zirconia on Co-Cr	p. 89
Phase Transformations in Multilayered CVD Mullite Coatings	p. 95
Producing and Controlling Substrate Temperature Uniformity from [actual symbol not reproducible] in CVD Rotating Disk Reactors	p. 101
Effect of Ion Bombardment on the Structure and Properties of PECVD SiO[subscript 2]	p. 107
Studies of PECVD and Ozone CVD Deposition Rate, Uniformity and Step Coverage	p. 113
Microstructures and Electrical Characterization of CVD-W and Mo Films as Contacts in Photocells	p. 119
Nucleation and Growth Processes During the Chemical Vapor Deposition of Diamond	p. 127
Molecular Beam Epitaxy of Boron Nitride Thin Films and Their Analytical Characterization	p. 139
Kinetics of Diamond-Like Film Growth Using Filament-Assisted Chemical Vapor Deposition	p. 151
Fabrication of Diamond and Diamond-Like Carbon by Low Pressure Inductively Coupled Plasma CVD	p. 157
Improvement of Adhesion of Diamond Coatings to WC(CO) Tool Substrates	p. 163
TEM Study of Growth Defects in CVD Diamond Films	p. 169
Achieving High Nucleation Density of Diamond Film Under Low Pressures in Hot-Filament Chemical Vapor Deposition	p. 175
CVD Precursors Containing Hydropyridine Ligands	p. 183
Organometallic Chemical Vapor Deposition: The Roles of Precursor Design and Growth Ambient in Film Properties	p. 195
Chemical Vapor Deposition of Ruthenium and Osmium Films from Mono- and Bis-(Cyclopentadienyl) Complexes as Precursors	p. 207
AlN Grown by Metalorganic Molecular Beam Epitaxy	p. 213
Preparation of Zinc Oxide Films by Low-Pressure Chemical Vapor Deposition Method	p. 219
TIN Dioxide Films Prepared by a Rapid Chemical Vapor Deposition Method	p. 225
Self-Lubricating, TiN-MoS[subscript 2] Composite Coatings Produced by Simultaneous Deposition from Ti [actual symbol not reproducible] Gas Mixtures	p. 231
The Chemical Vapor Deposition of Dispersed Phase Composites in the B-Si-C-H-Cl-Ar System	p. 239
Synthesis and Selected Micro-Mechanical Properties of Titanium Nitride Thin Films by the Pyrolysis of Tetrakis Titanium in Ammonia	p. 245
Functionally Gradient SiC Coatings Produced by Chemical Vapor Reaction	p. 251
CVD of Refractory Amorphous Metal Alloys	p. 257
Aerosol-Assisted Chemical Vapor Deposition (AACVD) of Binary Alloy Films: Studies of Film Composition	p. 263
Properties and Structural Characterization of the Laser Synthesized Nano-Composite Si-N-C Powders	p. 269
In-Situ Formation and Characterization of [actual symbol not reproducible] Whiskers from Nano Amorphous Si-N-C Powders	p. 275
Author Index	p. 281
Subject Index	p. 283
Table of Contents provided by Blackwell. All Rights Reserved.

ISBN: 9781558992641
ISBN-10: 1558992642
Series: MRS Proceedings
Audience: Professional
Format: Hardcover
Language: English
Number Of Pages: 283
Published: 5th April 1995
Publisher: Materials Research Society
Weight (kg): 1.0